Invention Grant
- Patent Title: Photoacid generator and photoresist comprising same
- Patent Title (中): 光生酸产生剂和包含其的光致抗蚀剂
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Application No.: US13711679Application Date: 2012-12-12
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Publication No.: US08956799B2Publication Date: 2015-02-17
- Inventor: Emad Aqad , Cheng-Bai Xu , Mingqi Li , William Williams, III
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/09

Abstract:
A photoacid generator includes those of formula (I): wherein each Ra in formula 1 is independently H, F, a C1-10 nonfluorinated organic group, C1-10 fluorinated organic group, or a combination comprising at least one of the foregoing, provided at least one Ra is F or a C1-10 fluorinated organic group, the C1-10 fluorinated and nonfluorinated organic groups each optionally comprising O, S, N, or a combination comprising at least one of the foregoing heteroatoms; L1 is a linking group comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing; G+ is an onium salt of the formula (II): wherein in formula (II), X is S or I, each R0 is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination comprising at least one of the foregoing, provided at least one R0 is substituted where each R0 is a C6 monocyclic aryl group, and wherein when X is I, a is 2, and where X is S, a is 3, p is 0 or 1, and q is an integer of from 1 to 10.
Public/Granted literature
- US20130171567A1 PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME Public/Granted day:2013-07-04
Information query
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