Invention Grant
US08985050B2 Substrate laser oxide removal process followed by electro or immersion plating
有权
基板激光氧化物去除工艺,然后电镀或浸镀
- Patent Title: Substrate laser oxide removal process followed by electro or immersion plating
- Patent Title (中): 基板激光氧化物去除工艺,然后电镀或浸镀
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Application No.: US12940703Application Date: 2010-11-05
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Publication No.: US08985050B2Publication Date: 2015-03-24
- Inventor: Robert J Von Gutfeld
- Applicant: Robert J Von Gutfeld
- Applicant Address: US NY New York
- Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee Address: US NY New York
- Agency: Baker Botts, LLP
- Main IPC: B05C1/06
- IPC: B05C1/06 ; B05C1/04 ; B05D3/06 ; C25D17/00 ; C25D5/10 ; C25D5/38 ; C25D5/36 ; C25D5/34 ; C25D5/44

Abstract:
Method of ablating the surface of a substrate including providing a dry substrate and an electrolyte source, ablating the surface of the dry substrate to at least partially remove a native oxide layer, and immersing the ablated dry substrate in the electrolyte source, in which the dry substrate is ablated prior to being introduced into the electrolyte source. Also provided is a method of ablating the surface of a substrate that includes providing a dry substrate and an electrolyte, depositing a portion of the electrolyte on the substrate at a thickness of less than 10 microns and ablating the surface of the substrate with the electrolyte applied thereon. System for use in the ablation of the surface of a substrate are also provided.
Public/Granted literature
- US20110104396A1 SUBSTRATE LASER OXIDE REMOVAL PROCESS FOLLOWED BY ELECTRO OR IMMERSION PLATING Public/Granted day:2011-05-05
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