发明授权
US08993536B2 Low-molecular polysulfated hyaluronic acid derivative and medicine containing same
有权
低分子多硫酸化透明质酸衍生物及其含有药物
- 专利标题： Low-molecular polysulfated hyaluronic acid derivative and medicine containing same
- 专利标题（中）： 低分子多硫酸化透明质酸衍生物及其含有药物
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申请号： US13143129申请日： 2010-02-01
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公开(公告)号： US08993536B2公开(公告)日： 2015-03-31
- 发明人: Kazuaki Kakehi , Hiroaki Asai , Naohiro Hayashi , Satoshi Shimizu , Fumitaka Goto , Yasuo Koga , Takahiro Tomoyasu , Takao Taki , Yusuke Kato , Satoru Nakazato , Junji Takaba , Atsushi Azuma , Wakako Hirano , Kazunari Izumi , Minoru Kashimoto , Yoko Sakamoto , Takashi Hayashi , Masaru Nishida
- 申请人： Kazuaki Kakehi , Hiroaki Asai , Naohiro Hayashi , Satoshi Shimizu , Fumitaka Goto , Yasuo Koga , Takahiro Tomoyasu , Takao Taki , Yusuke Kato , Satoru Nakazato , Junji Takaba , Atsushi Azuma , Wakako Hirano , Kazunari Izumi , Minoru Kashimoto , Yoko Sakamoto , Takashi Hayashi , Masaru Nishida
- 申请人地址： JP Osaka-shi JP Chiyoda-ku
- 专利权人： Otsuka Chemical Co., Ltd.,Otsuka Pharmaceutical Co., Ltd.
- 当前专利权人： Otsuka Chemical Co., Ltd.,Otsuka Pharmaceutical Co., Ltd.
- 当前专利权人地址： JP Osaka-shi JP Chiyoda-ku
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2009-021820 20090202
- 国际申请： PCT/JP2010/000583 WO 20100201
- 国际公布： WO2010/087207 WO 20100805
- 主分类号： A61K31/728
- IPC分类号： A61K31/728 ; A61P11/06 ; A61P17/00 ; A61P37/08 ; C08B37/08
摘要：
A low-molecular-weight polysulfated hyaluronic acid derivative useful for treatment of an allergic disease. An agent for treatment of an allergic disease selected from pollinosis, allergic rhinitis, allergic conjunctivitis, atopic dermatitis, and asthma, represented by the following general formula (IA) or (IB); wherein n represents a number of 0 to 15; R's each independently represent a hydrogen atom or an SO3H group etc.
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