Invention Grant
- Patent Title: Methods to prevent filler entrapment in microelectronic device to microelectronic substrate interconnection structures
- Patent Title (中): 防止填料在微电子器件中捕获到微电子衬底互连结构的方法
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Application No.: US13925967Application Date: 2013-06-25
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Publication No.: US08999765B2Publication Date: 2015-04-07
- Inventor: Manish Dubey , Rajendra C. Dias , Yonghao Xiu , Arjun Krishnan , Yiqun Bai , Purushotham Kaushik Muthur Srinath
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Winkle, PLLC
- Main IPC: H01L23/488
- IPC: H01L23/488 ; H01L21/56

Abstract:
Embodiments of the present description include methods for attaching a microelectronic device to a microelectronic substrate with interconnection structures after disposing of an underfill material on the microelectronic device, wherein filler particles within the underfill material may be repelled away from the interconnection structures prior to connecting the microelectronic device to the microelectronic structure. These methods may include inducing a charge on the interconnection structures and may include placing the interconnection structures between opposing plates and producing a bias between the opposing plates after depositing the underfill material on the interconnection structures.
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Information query
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