Invention Grant
US09046767B2 Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
有权
光酸发生剂，光致抗蚀剂，被覆基材，以及形成电子器件的方法
- Patent Title: Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
- Patent Title (中): 光酸发生剂，光致抗蚀剂，被覆基材，以及形成电子器件的方法
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Application No.: US14063148Application Date: 2013-10-25
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Publication No.: US09046767B2Publication Date: 2015-06-02
- Inventor: Emad Aqad , Irvinder Kaur , Cong Liu , Mingqi Li , Cheng-Bai Xu
- Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Applicant Address: US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee Address: US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; C07C381/12 ; C07D319/04 ; C07D319/08 ; G03F7/027
Abstract:
A photoacid generator compound has the formula (1) wherein a, b, c, d, e, x, L1, L2, L3, L4, R1, R2, X, and Z− are defined herein. The photoacid generator compound exhibits good solubility in solvents typically used to formulate photoresist compositions and negative tone developers. Described herein are a photoresist composition including the photoacid generator compound, a coated substrate including the photoresist composition, and a device-forming method utilizing the photoresist composition.
Public/Granted literature
- US20150118618A1 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE Public/Granted day:2015-04-30
Information query
IPC分类:
