Transistor and semiconductor structure

Invention Grant

US09076784B2 Transistor and semiconductor structure 有权

Title translation: 晶体管和半导体结构

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Patent Title: Transistor and semiconductor structure
Patent Title (中): 晶体管和半导体结构
Application No.: US14454727

Application Date: 2014-08-08
Publication No.: US09076784B2

Publication Date: 2015-07-07
Inventor: Min-Chuan Tsai , Hsin-Fu Huang , Chi-Mao Hsu , Chin-Fu Lin , Chien-Hao Chen , Wei-Yu Chen , Chi-Yuan Sun , Ya-Hsueh Hsieh , Tsun-Min Cheng
Applicant: UNITED MICROELECTRONICS CORP.
Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
Assignee: UNITED MICROELECTRONICS CORP.
Current Assignee: UNITED MICROELECTRONICS CORP.
Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
Agent Winston Hsu; Scott Margo
Main IPC: H01L29/78
IPC: H01L29/78 ; H01L29/49 ; H01L21/28 ; H01L29/51 ; H01L29/66 ; H01L21/8238

Abstract:

A semiconductor structure includes a work function metal layer, a (work function) metal oxide layer and a main electrode. The work function metal layer is located on a substrate. The (work function) metal oxide layer is located on the work function metal layer. The main electrode is located on the (work function) metal oxide layer. A semiconductor process forming said semiconductor structure is also provided.

Abstract(Chinese):

半导体结构包括功函数金属层，（功函数）金属氧化物层和主电极。功函数金属层位于基板上。（功函数）金属氧化物层位于功函数金属层上。主电极位于（功函数）金属氧化物层上。还提供了形成所述半导体结构的半导体工艺。

Public/Granted literature

US20140346616A1 TRANSISTOR AND SEMICONDUCTOR STRUCTURE Public/Granted day:2014-11-27

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L29/00	专门适用于整流、放大、振荡或切换，并具有至少一个电位跃变势垒或表面势垒的半导体器件；具有至少一个电位跃变势垒或表面势垒，例如PN结耗尽层或载流子集结层的电容器或电阻器；半导体本体或其电极的零部件（H01L31/00至H01L47/00，H01L51/05优先；除半导体或其电极之外的零部件入H01L23/00；由在一个共用衬底内或其上形成的多个固态组件组成的器件入H01L27/00）
H01L29/66	.按半导体器件的类型区分的
H01L29/68	..只能通过对一个不通有待整流、放大或切换的电流的电极供给电流或施加电位方可进行控制的（H01L29/96优先）
H01L29/76	...单极器件
H01L29/772	....场效应晶体管
H01L29/78	.....由绝缘栅产生场效应的