Invention Grant
- Patent Title: Apparatus and method for providing uniform flow of gas
- Patent Title (中): 提供气体均匀流动的装置和方法
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Application No.: US13653952Application Date: 2012-10-17
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Publication No.: US09109754B2Publication Date: 2015-08-18
- Inventor: Joseph Yudovsky , Mei Chang , Faruk Gungor , Paul F. Ma , David Chu , Chien-Teh Kao , Hyman Lam , Dien-Yeh Wu
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: F16K11/20
- IPC: F16K11/20 ; F17D3/00
Abstract:
Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectable with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
Public/Granted literature
- US20130098477A1 Apparatus and Method for Providing Uniform Flow of Gas Public/Granted day:2013-04-25
Information query
