Invention Grant
- Patent Title: Silane or borane treatment of metal thin films
- Patent Title (中): 硅烷或硼烷处理金属薄膜
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Application No.: US14300986Application Date: 2014-06-10
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Publication No.: US09111749B2Publication Date: 2015-08-18
- Inventor: Eric Shero , Suvi Haukka
- Applicant: ASM IP HOLDING B.V.
- Applicant Address: NL
- Assignee: ASM IP HOLDINGS B.V.
- Current Assignee: ASM IP HOLDINGS B.V.
- Current Assignee Address: NL
- Agency: Knobbe Martens Olson & Bear LLP
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/469 ; H01L21/02 ; H01L21/28 ; H01L21/3105 ; H01L21/321 ; H01L29/49 ; H01L29/51
Abstract:
The negative effect of oxygen on some metal films can be reduced or prevented by contacting the films with a treatment agent comprising silane or borane. In some embodiments, one or more films in an NMOS gate stack are contacted with a treatment agent comprising silane or borane during or after deposition.
Public/Granted literature
- US20140295673A1 SILANE OR BORANE TREATMENT OF METAL THIN FILMS Public/Granted day:2014-10-02
Information query
IPC分类:
