Invention Grant
US09128372B2 Dendritic compounds, photoresist compositions and methods of making electronic devices 有权
树枝状化合物,光致抗蚀剂组合物和制造电子器件的方法

Dendritic compounds, photoresist compositions and methods of making electronic devices
Abstract:
Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices.
Information query
Patent Agency Ranking
0/0