Invention Grant
US09128372B2 Dendritic compounds, photoresist compositions and methods of making electronic devices
有权
树枝状化合物,光致抗蚀剂组合物和制造电子器件的方法
- Patent Title: Dendritic compounds, photoresist compositions and methods of making electronic devices
- Patent Title (中): 树枝状化合物,光致抗蚀剂组合物和制造电子器件的方法
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Application No.: US14145551Application Date: 2013-12-31
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Publication No.: US09128372B2Publication Date: 2015-09-08
- Inventor: Emad Aqad , Cheng-Bai Xu , Irvinder Kaur , Mingqi Li , Jibin Sun , Cecily Andes
- Applicant: Rohm and Haas Electronic Materials LLC
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; C07C309/00 ; C07C69/74 ; C07C303/32

Abstract:
Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices.
Public/Granted literature
- US20140186770A1 DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES Public/Granted day:2014-07-03
Information query
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