Invention Grant
- Patent Title: Method and apparatus for feedback-based resistance calibration
- Patent Title (中): 用于基于反馈的电阻校准的方法和装置
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Application No.: US13547101Application Date: 2012-07-12
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Publication No.: US09134360B2Publication Date: 2015-09-15
- Inventor: Tao Wen Chung , Chan-Hong Chern , Ming-Chieh Huang , Chih-Chang Lin , Yuwen Swei
- Applicant: Tao Wen Chung , Chan-Hong Chern , Ming-Chieh Huang , Chih-Chang Lin , Yuwen Swei
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: H03L5/00
- IPC: H03L5/00 ; G01R31/26

Abstract:
A circuit has a first circuit module including a first resistor and first and second transistors coupled in parallel with the first resistor. The first resistor and the first and second transistors are coupled together at a first node. An equivalent resistance across the first circuit module increases as a voltage of the first node is increased from a first voltage to a second voltage, and the equivalent resistance across the first circuit module decreases as the voltage of the first node is increased from the second voltage to a third voltage.
Public/Granted literature
- US20140015611A1 METHOD AND APPARATUS FOR FEEDBACK-BASED RESISTANCE CALIBRATION Public/Granted day:2014-01-16
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