Invention Grant
US09140977B2 Imaging devices, methods of forming same, and methods of forming semiconductor device structures
有权
成像装置，其形成方法以及形成半导体器件结构的方法
- Patent Title: Imaging devices, methods of forming same, and methods of forming semiconductor device structures
- Patent Title (中): 成像装置，其形成方法以及形成半导体器件结构的方法
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Application No.: US13892711Application Date: 2013-05-13
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Publication No.: US09140977B2Publication Date: 2015-09-22
- Inventor: Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton J. deVilliers , Michael Hyatt , Jianming Zhou , Scott L. Light , Dan B. Millward
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: G03F1/36
- IPC: G03F1/36 ; G03F1/38 ; G03F1/54
Abstract:
An imaging device comprising a first region and a second region. Imaging features in the first region and assist features in the second region are substantially the same size as one another and are formed substantially on pitch. Methods of forming an imaging device and methods of forming a semiconductor device structure are also disclosed.
Public/Granted literature
- US20130252142A1 IMAGING DEVICES, METHODS OF FORMING SAME, AND METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES Public/Granted day:2013-09-26
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