Invention Grant
- Patent Title: Method of detecting a defect of a substrate and apparatus for performing the same
- Patent Title (中): 检测基板的缺陷的方法及其执行装置
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Application No.: US14316173Application Date: 2014-06-26
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Publication No.: US09194816B2Publication Date: 2015-11-24
- Inventor: Min-Ho Rim , Yu-Sin Yang , Sang-Kil Lee , Yong-Deok Jeong , Hyung-Suk Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, PA
- Priority: KR10-2013-0106919 20130906
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/956 ; G01N21/95 ; G01N21/88

Abstract:
In a method of detecting a defect of a substrate, a first light having a first intensity may be irradiated to a first region of the substrate through a first aperture. A defect in the first region may be detected using a first reflected light from the first region. A second light having a second intensity may be irradiated to a second region of the substrate through a second aperture. A defect in the second region may be detected using a second reflected light from the second region. Thus, the defects by the regions of the substrate may be accurately detected.
Public/Granted literature
- US20150070690A1 Method of Detecting a Defect of a Substrate and Apparatus for Performing the Same Public/Granted day:2015-03-12
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