Invention Grant
- Patent Title: Non-uniform substrate stackup
- Patent Title (中): 非均匀衬底叠层
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Application No.: US13707113Application Date: 2012-12-06
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Publication No.: US09232639B2Publication Date: 2016-01-05
- Inventor: Zhichao Zhang , Tao Wu , Zhiguo Qian , Kemal Aygun
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: H05K7/10
- IPC: H05K7/10 ; H05K1/02 ; H01L23/498 ; H01L21/48

Abstract:
Some embodiments described herein include apparatuses and methods of forming such apparatuses. One such embodiment may include a routing arrangement having pads to be coupled to a semiconductor die, with a first trace coupled to a first pad among the pads, and a second trace coupled to a second pad among the pads. The first and second traces may have different thicknesses. Other embodiments including additional apparatuses and methods are described.
Public/Granted literature
- US20140160707A1 NON-UNIFORM SUBSTRATE STACKUP Public/Granted day:2014-06-12
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