Invention Grant
US09299621B2 Smart measurement techniques to enhance inline process control stability
有权
智能测量技术，可提高在线过程控制的稳定性
- Patent Title: Smart measurement techniques to enhance inline process control stability
- Patent Title (中): 智能测量技术，可提高在线过程控制的稳定性
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Application No.: US14024688Application Date: 2013-09-12
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Publication No.: US09299621B2Publication Date: 2016-03-29
- Inventor: Han-Wei Yang , Yi-Ruei Lin , Chen-Chung Lai , Kang-Min Kuo , Bor-Zen Tien
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eshweiler & Associates, LLC
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L21/66 ; H01L27/088
Abstract:
An integrated circuit includes a number of lateral diffusion measurement structures arranged on a silicon substrate. A lateral diffusion measurement structure includes a p-type region and an n-type region which cooperatively span a predetermined initial distance between opposing outer edges of the lateral diffusion measurement structure. The p-type and n-type regions meet at a p-n junction expected to be positioned at a target junction location after dopant diffusion has occurred.
Public/Granted literature
- US20150069395A1 Smart Measurement Techniques to Enhance Inline Process Control Stability Public/Granted day:2015-03-12
Information query
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