Invention Grant
- Patent Title: Developing treatment apparatus and developing treatment method
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Application No.: US14022434Application Date: 2013-09-10
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Publication No.: US09304398B2Publication Date: 2016-04-05
- Inventor: Yasushi Takiguchi , Taro Yamamoto , Yoshinori Ikeda , Koki Yoshimura , Yoshiki Okamoto , Masahiro Fukuda
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2012-201117 20120913; JP2013-162536 20130805
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03C5/26 ; G03F7/30 ; H01L21/67

Abstract:
The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.
Public/Granted literature
- US20140071411A1 DEVELOPING TREATMENT APPARATUS AND DEVELOPING TREATMENT METHOD Public/Granted day:2014-03-13
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