Invention Grant
- Patent Title: Sapphire substrate and method for manufacturing the same and nitride semiconductor light emitting element
- Patent Title (中): 蓝宝石基板及其制造方法和氮化物半导体发光元件
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Application No.: US14593728Application Date: 2015-01-09
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Publication No.: US09337390B2Publication Date: 2016-05-10
- Inventor: Naoya Sako , Takashi Ohara , Yoshiki Inoue , Yuki Shibutani , Yoshihito Kawauchi , Kazuyuki Takeichi , Yasunori Nagahama
- Applicant: NICHIA CORPORATION
- Applicant Address: JP Anan-Shi
- Assignee: NICHIA CORPORATION
- Current Assignee: NICHIA CORPORATION
- Current Assignee Address: JP Anan-Shi
- Agency: Foley & Lardner LLP
- Priority: JPP2012-074667 20120328; JPP2013-049919 20130313
- Main IPC: H01L33/32
- IPC: H01L33/32 ; C30B25/18 ; C30B29/20 ; C30B29/40 ; C30B33/08 ; C30B33/10 ; C30B33/12 ; H01L21/308 ; H01L21/02 ; H01L33/24

Abstract:
A method for manufacturing a sapphire substrate in which a plurality of projections are formed on a C-plane of the sapphire substrate by etching, includes: forming a patterned etching mask on the C-plane of the sapphire substrate; etching the sapphire substrate until the projections are formed, wherein each of the projections formed by the etching has a substantially triangular pyramidal-shape and has a plurality of side surfaces, a pointed top and a bottom, wherein the bottom of each of the projections has a substantially triangular shape having three outwardly curved arc-shaped sides. The projections are arranged on vertexes of a triangular lattice, and an orientation of the bottom of the projections conforms with an orientation that is rotated by about 30 degrees from an orientation of a triangle of the triangular lattice; and removing the etching mask from the sapphire substrate.
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