Invention Grant
- Patent Title: Bipolar semiconductor device and method of manufacturing thereof
- Patent Title (中): 双极半导体器件及其制造方法
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Application No.: US14153377Application Date: 2014-01-13
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Publication No.: US09484221B2Publication Date: 2016-11-01
- Inventor: Gerhard Schmidt , Josef Georg Bauer
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L21/324 ; H01L29/66 ; H01L29/739 ; H01L29/861 ; H01L29/08 ; H01L21/265 ; H01L27/07

Abstract:
A power semiconductor device has a semiconductor body having a first surface and a second surface that runs substantially parallel to the first surface. A first metallization is arranged on the first surface. A second metallization is arranged on the second surface. The semiconductor body includes an n-doped first semiconductor region spaced apart from the first metallization and having a first maximum doping concentration, an n-doped second semiconductor region having a second maximum doping concentration higher than the first maximum doping concentration and adjoining the first semiconductor region, and a third semiconductor region in ohmic contact with the second metallization, arranged between the second metallization and the second semiconductor region, and adjoining the second semiconductor region. The second semiconductor region is made of a semiconductor material which includes electrically active chalcogen impurities as donors. At least 90% of the electrically active chalcogen impurities form isolated defects in the semiconductor material.
Public/Granted literature
- US20150200247A1 Bipolar Semiconductor Device and Method of Manufacturing Thereof Public/Granted day:2015-07-16
Information query
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