Invention Grant
- Patent Title: Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications
- Patent Title (中): 变频微波（VFM）工艺及半导体薄膜制造中的应用
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Application No.: US14322484Application Date: 2014-07-02
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Publication No.: US09548200B2Publication Date: 2017-01-17
- Inventor: Loke Yuen Wong , Ke Chang , Yueh Sheng Ow , Ananthkrishna Jupudi , Glen T. Mori , Aksel Kitowski , Arkajit Roy Barman
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/02 ; H01L21/3105 ; H01L21/67
Abstract:
Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
Public/Granted literature
- US20150056819A1 VARIABLE FREQUENCY MICROWAVE (VFM) PROCESSES AND APPLICATIONS IN SEMICONDUCTOR THIN FILM FABRICATIONS Public/Granted day:2015-02-26
Information query
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