Invention Grant
- Patent Title: Large area nitride crystal and method for making it
- Patent Title (中): 大面积氮化物晶体及其制造方法
-
Application No.: US13731453Application Date: 2012-12-31
-
Publication No.: US09564320B2Publication Date: 2017-02-07
- Inventor: Mark P. D'Evelyn , James S. Speck , Derrick S. Kamber , Douglas W. Pocius
- Applicant: SORAA, INC.
- Applicant Address: US CA Fremont
- Assignee: Soraa, Inc.
- Current Assignee: Soraa, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Saul Ewing LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/20 ; C30B25/02 ; C30B25/18 ; C30B29/40 ; C30B33/06

Abstract:
Techniques for processing materials in supercritical fluids including processing in a capsule disposed within a high-pressure apparatus enclosure are disclosed. The disclosed techniques are useful for growing crystals of GaN, AlN, InN, and their alloys, including InGaN, AlGaN, and AlInGaN for the manufacture of bulk or patterned substrates, which in turn can be used to make optoelectronic devices, lasers, light emitting diodes, solar cells, photoelectrochemical water splitting and hydrogen generation devices, photodetectors, integrated circuits, and transistors.
Public/Granted literature
- US20130119401A1 LARGE AREA NITRIDE CRYSTAL AND METHOD FOR MAKING IT Public/Granted day:2013-05-16
Information query
IPC分类: