Invention Grant
US09570268B2 Electron gun, charged particle gun, and charged particle beam apparatus using electron gun and charged particle gun
有权
电子枪,带电粒子枪和使用电子枪和带电粒子枪的带电粒子束装置
- Patent Title: Electron gun, charged particle gun, and charged particle beam apparatus using electron gun and charged particle gun
- Patent Title (中): 电子枪,带电粒子枪和使用电子枪和带电粒子枪的带电粒子束装置
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Application No.: US14787263Application Date: 2014-04-14
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Publication No.: US09570268B2Publication Date: 2017-02-14
- Inventor: Yuta Imai , Takashi Ohshima , Hideo Morishita
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2013-092484 20130425
- International Application: PCT/JP2014/060575 WO 20140414
- International Announcement: WO2014/175087 WO 20141030
- Main IPC: H01J29/28
- IPC: H01J29/28 ; H01J29/00 ; H01J27/02 ; H01J37/073 ; H01J27/26 ; H01J37/063 ; H01J37/08 ; H01J37/28 ; H01J37/06 ; H01J29/48 ; H01J37/145 ; H01J37/20

Abstract:
The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.
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