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    Electron microscope and electron beam detector
    6.
    发明授权
    Electron microscope and electron beam detector 有权
    电子显微镜和电子束检测器

    公开(公告)号：US09355815B2

    公开(公告)日：2016-05-31

    申请号：US14423081

    申请日：2013-08-09

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Shin Imamura ,  Takashi Ohshima ,  Yoichi Ose ,  Kenichi Hirane

    IPC: H01J37/00 ,  H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/28 ,  H01J2237/2801

    Abstract: An electron microscope is provided with a scintillator (7) and a light guide (8). The scintillator (7) has an index of refraction greater than the index of refraction of the light guide (8), and an end surface (72) joined to the light guide (8) is formed from a curved surface with a convex shape on the outside. The scintillator (7) is formed by a Y—Al—O based ceramic sintered body represented by the compositional formula (Ln1-xCex)3M5O12 (wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).

    Abstract translation: 电子显微镜设有闪烁体（7）和光导（8）。 闪烁体（7）的折射率大于导光体（8）的折射率，与导光体（8）接合的端面（72）由凸形的曲面形成 外。 闪烁体（7）由组成式（Ln1-xCex）3M5O12表示的Y-Al-O系陶瓷烧结体形成（其中Ln表示选自Y，Gd，La和 Lu和M表示Al和Ga中的任一个或两者）。

    Charged particle beam apparatus
    7.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US09208995B2

    公开(公告)日：2015-12-08

    申请号：US14379291

    申请日：2013-02-15

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yusuke Ominami ,  Takashi Ohshima ,  Hiroyuki Ito ,  Mitsugu Sato ,  Sukehiro Ito

    IPC: G21K5/00 ,  H01J37/28 ,  H01J37/16 ,  H01J37/18 ,  H01J37/09

    CPC classification number: H01J37/28 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/0451 ,  H01J2237/06341 ,  H01J2237/10 ,  H01J2237/1405 ,  H01J2237/164 ,  H01J2237/2608 ,  H01J2237/2801

    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110). The first diaphragm (10) is attached to the pipe (23), and the pipe (23) and the third housing (22) can be attached to and detached from the lens barrel (3) in the direction of the optical axis (30). A space (105) surrounded by the first housing (4) and the second housing (100) is depressurized, and the sample (6) arranged inside the recessed section (100a) is irradiated with a charged particle beam.

    Abstract translation: 提供了一种带电粒子束装置（111），隔膜（101）可以从其中容易地附接和拆卸，并且其中样品（6）可以在真空和高压下布置。 带电粒子束装置包括：保持带电粒子源（110）和电子光学系统（1,2,7）的镜筒（3）; 连接到镜筒（3）的第一壳体（4）; 第二壳体（100），其凹入到所述第一壳体（4）的内部; 分离透镜筒（3）内的空间与第一壳体（4）内的空间的第一隔膜（10），带电粒子束通过该第一隔膜 第二隔膜（101），其分离所述第二壳体（100）中的所述凹部（100a）的内部和外部的空间，并且所述带电粒子束穿过所述第二隔膜; 以及连接到容纳所述带电粒子源（110）的第三壳体（22）的管道（23）。 第一隔膜（10）附接到管道（23），并且管道（23）和第三壳体（22）可以沿着光轴（30）的方向附接到镜筒（3）并从镜筒 ）。 由第一壳体（4）和第二壳体（100）围绕的空间（105）被减压，并且将配置在凹部（100a）内部的样品（6）照射带电粒子束。

    ELECTRON MICROSCOPE AND ELECTRON BEAM DETECTOR
    8.
    发明申请
    ELECTRON MICROSCOPE AND ELECTRON BEAM DETECTOR 有权
    电子显微镜和电子束检测器

    公开(公告)号：US20150214002A1

    公开(公告)日：2015-07-30

    申请号：US14423081

    申请日：2013-08-09

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Shin Imamura ,  Takashi Ohshima ,  Yoichi Ose ,  Kenichi Hirane

    IPC: H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/28 ,  H01J2237/2801

    Abstract: An electron microscope is provided with a scintillator (7) and a light guide (8). The scintillator (7) has an index of refraction greater than the index of refraction of the light guide (8), and an end surface (72) joined to the light guide (8) is formed from a curved surface with a convex shape on the outside. The scintillator (7) is formed by a Y—Al—O based ceramic sintered body represented by the compositional formula (Ln1-xCex)3M5O12 (wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).

    Abstract translation: 电子显微镜设有闪烁体（7）和光导（8）。 闪烁体（7）具有大于导光体（8）的折射率的折射率，与导光体（8）接合的端面（72）由凸形的曲面形成 外。 闪烁体（7）由组成式（Ln1-xCex）3M5O12表示的Y-Al-O系陶瓷烧结体形成（其中Ln表示选自Y，Gd，La和 Lu和M表示Al和Ga中的任一个或两者）。

    CHARGED PARTICLE BEAM APPARATUS
    9.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号：US20150014530A1

    公开(公告)日：2015-01-15

    申请号：US14379291

    申请日：2013-02-15

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yusuke Ominami ,  Takashi Ohshima ,  Hiroyuki Ito ,  Mitsugu Sato ,  Sukehiro Ito

    IPC: H01J37/28 ,  H01J37/09 ,  H01J37/18

    CPC classification number: H01J37/28 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/0451 ,  H01J2237/06341 ,  H01J2237/10 ,  H01J2237/1405 ,  H01J2237/164 ,  H01J2237/2608 ,  H01J2237/2801

    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110). The first diaphragm (10) is attached to the pipe (23), and the pipe (23) and the third housing (22) can be attached to and detached from the lens barrel (3) in the direction of the optical axis (30). A space (105) surrounded by the first housing (4) and the second housing (100) is depressurized, and the sample (6) arranged inside the recessed section (100a) is irradiated with a charged particle beam.

    Abstract translation: 提供了一种带电粒子束装置（111），隔膜（101）可以从其中容易地附接和拆卸，并且其中样品（6）可以在真空和高压下布置。 带电粒子束装置包括：保持带电粒子源（110）和电子光学系统（1,2,7）的镜筒（3）; 连接到镜筒（3）的第一壳体（4）; 第二壳体（100），其凹入到所述第一壳体（4）的内部; 分离透镜筒（3）内的空间与第一壳体（4）内的空间的第一隔膜（10），带电粒子束通过该第一隔膜 第二隔膜（101），其分离所述第二壳体（100）中的所述凹部（100a）的内部和外部的空间，并且所述带电粒子束通过所述第二隔膜; 以及连接到容纳所述带电粒子源（110）的第三壳体（22）的管道（23）。 第一隔膜（10）附接到管道（23），并且管道（23）和第三壳体（22）可以沿着光轴（30）的方向附接到镜筒（3）并从镜筒 ）。 由第一壳体（4）和第二壳体（100）围绕的空间（105）被减压，并且将配置在凹部（100a）内部的样品（6）照射带电粒子束。

    Electric field discharge-type electron source
    10.
    发明授权
    Electric field discharge-type electron source 有权
    电场放电型电子源

    公开(公告)号：US08866371B2

    公开(公告)日：2014-10-21

    申请号：US14239144

    申请日：2012-09-24

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Souichi Katagiri ,  Takashi Ohshima ,  Sukehiro Ito

    IPC: H01J1/14 ,  H01J19/06 ,  H01K1/04

    CPC classification number: H01J37/073 ,  H01J1/16 ,  H01J1/3044 ,  H01J9/025 ,  H01J9/04 ,  H01J37/06 ,  H01J2237/06316 ,  H01J2237/06341

    Abstract: Increasing the volume or weight of zirconia which is a diffusion and supply source, to extend the life of a field-emission type electron source causes a problem that the diffusion and supply source itself or a tungsten needle is easily subjected to damage. As another problem, although it is considered to form the diffusion and supply source using a thin film to avoid the above-described problem, it is difficult to stably obtain practical life exceeding 8,000 hours. It has been found that practical life exceeding 8,000 hours is stably obtained by providing a field-emission type electron source that has no chips or cracks in a diffusion and supply source and that can extend life with a little bit of an increase in the amount of the diffusion and supply source.

    Abstract translation: 增加作为扩散源和供应源的氧化锆的体积或重量，延长场致发射型电子源的寿命引起扩散和供给源本身或钨针容易受到损伤的问题。 作为另一个问题，虽然考虑使用薄膜形成扩散和供应源以避免上述问题，但是难以稳定地获得超过8000小时的实际寿命。 已经发现，通过提供在扩散和供给源中不产生切屑或裂纹的场发射型电子源，可以稳定地获得超过8000小时的实际寿命，并且可以延长使用寿命，同时增加使用量 扩散和供应源。

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