发明授权
- 专利标题: Apparatus and method for wafer level bonding
- 专利标题(中): 晶圆级接合装置及方法
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申请号: US14298692申请日: 2014-06-06
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公开(公告)号: US09576827B2公开(公告)日: 2017-02-21
- 发明人: Ping-Yin Liu , Yen-Chang Chu , Xin-Hua Huang , Lan-Lin Chao , Yeur-Luen Tu , Ru-Liang Lee
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; H01L21/67 ; H01L25/00 ; B23B31/30
摘要:
A system for and a method of bonding a first wafer to a second wafer are provided. A second wafer chuck has a second surface, a profile of the second surface being adjustable by a profile control layer. The first wafer is placed on a first surface of a first wafer chuck, and the second wafer is placed on the second surface of the second wafer chuck. The first wafer and the second wafer are warped prior to bonding to form a first warped wafer and a second warped wafer, respectively. The first warped wafer is bonded to the second warped wafer.
公开/授权文献
- US20150357226A1 Apparatus and Method for Wafer Level Bonding 公开/授权日:2015-12-10
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