发明授权
US09579624B2 Gas reactor devices with microplasma arrays encapsulated in defect free oxide
有权
具有微量等离子体阵列的气体反应器装置封装在无缺陷氧化物中
- 专利标题: Gas reactor devices with microplasma arrays encapsulated in defect free oxide
- 专利标题(中): 具有微量等离子体阵列的气体反应器装置封装在无缺陷氧化物中
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申请号: US14591242申请日: 2015-01-07
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公开(公告)号: US09579624B2公开(公告)日: 2017-02-28
- 发明人: J. Gary Eden , Sung-Jin Park , Jin Hoon Cho , Seung Hoon Sung , Min Hwan Kim
- 申请人: The Board of Trustees of the University of Illinois
- 申请人地址: US IL Urbana
- 专利权人: The Board of Trustees of the University of Illinois
- 当前专利权人: The Board of Trustees of the University of Illinois
- 当前专利权人地址: US IL Urbana
- 代理机构: Greer, Burns & Crain, Ltd.
- 代理商 Steven P. Fallon
- 主分类号: B01J19/00
- IPC分类号: B01J19/00 ; H01J37/32 ; C25D11/02 ; H01J11/18 ; C25D11/12 ; C25D11/18 ; C25D11/26 ; H01J17/16 ; H01J11/22 ; H01J11/34 ; H01J17/06 ; C01B13/11 ; H05H1/24
摘要:
A gas reactor device includes a plurality of microcavities or microchannels defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavities or microchannels to stimulate plasma generation therein upon application of suitable voltage. One or more or all of the electrodes are encapsulated within the thick metal oxide layer. A gas inlet is configured to receive feedstock gas into the plurality of microcavities or microchannels. An outlet is configured to outlet reactor product from the plurality of microcavities or microchannels. In an example preferred device, the feedstock gas is air or O2 and is converted by the plasma into ozone (O3). In another preferred device, the feedstock gas is an unwanted gas to be decomposed into a desired form. Gas reactor devices of the invention can, for example, decompose gases such as CO2, CH4, or NOx.