Invention Grant
- Patent Title: Photoresist overcoat compositions
- Patent Title (中): 光刻胶外涂层组合物
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Application No.: US14927357Application Date: 2015-10-29
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Publication No.: US09581904B2Publication Date: 2017-02-28
- Inventor: Choong-Bong Lee , Stefan J. Caporale , Jason A. DeSisto , Jong Keun Park , Cong Liu , Cheng-Bai Xu , Cecily Andes
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent Jonathan D. Baskin
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/38 ; G03F7/11 ; G03F7/004 ; G03F7/075 ; G03F7/09 ; G03F7/20 ; C09D4/06 ; C09D133/06
Abstract:
Photoresist overcoat compositions are provided. The compositions comprise: a matrix polymer, an additive polymer a basic quencher and an organic solvent. The additive polymer has a lower surface energy than a surface energy of the matrix polymer, and the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition. The compositions have particular applicability in the semiconductor manufacturing industry for use in negative tone development processes.
Public/Granted literature
- US20160122574A1 PHOTORESIST OVERCOAT COMPOSITIONS Public/Granted day:2016-05-05
Information query
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