发明授权
- 专利标题： Gas cushion apparatus and techniques for substrate coating
- 专利标题（中）： 气垫装置和基材涂层技术
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申请号： US14697370申请日： 2015-04-27
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公开(公告)号： US09586226B2公开(公告)日： 2017-03-07
- 发明人: Alexander Sou-Kang Ko , Justin Mauck , Eliyahu Vronsky , Conor F. Madigan , Eugene Rabinovich , Nahid Harjee , Christopher Buchner , Gregory Lewis
- 申请人： Kateeva, Inc.
- 申请人地址： US CA Newark
- 专利权人： Kateeva, Inc.
- 当前专利权人： Kateeva, Inc.
- 当前专利权人地址： US CA Newark
- 主分类号： B05C13/00
- IPC分类号： B05C13/00 ; B05C5/00 ; B05B15/06 ; B05D3/06 ; B05D3/02 ; H01L51/00 ; B41J3/407 ; B05C15/00 ; C23C14/00 ; H01L21/67 ; H01L21/677 ; H01L21/683 ; H01L23/532 ; H05K3/00 ; H01L21/48
摘要：
A coating can be provided on a substrate. Fabrication of the coating can include forming a solid layer in a specified region of the substrate while supporting the substrate in a coating system using a gas cushion. For example, a liquid coating can be printed over the specified region while the substrate is supported by the gas cushion. The substrate can be held for a specified duration after the printing the patterned liquid. The substrate can be conveyed to a treatment zone while supported using the gas cushion. The liquid coating can be treated to provide the solid layer including continuing to support the substrate using the gas cushion.
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