- Patent Title: Method and system for epitaxy processes on miscut bulk substrates
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Application No.: US14992939Application Date: 2016-01-11
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Publication No.: US09653650B2Publication Date: 2017-05-16
- Inventor: Arpan Chakraborty , Michael Grundmann , Anurag Tyagi
- Applicant: SORAA, INC.
- Applicant Address: US CA Fremont
- Assignee: Soraa, Inc.
- Current Assignee: Soraa, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Saul Ewing LLP
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L21/00 ; H01L33/32 ; H01L21/02 ; H01L33/16 ; H01L33/06 ; H01L33/12
Abstract:
A method for providing (Al,Ga,In)N thin films on Ga-face c-plane (Al,Ga,In)N substrates using c-plane surfaces with a miscut greater than at least 0.35 degrees toward the m-direction. Light emitting devices are formed on the smooth (Al,Ga,In)N thin films. Devices fabricated on the smooth surfaces exhibit improved performance.
Public/Granted literature
- US20160268476A1 METHOD AND SYSTEM FOR EPITAXY PROCESSES ON MISCUT BULK SUBSTRATES Public/Granted day:2016-09-15
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