- Patent Title: Method for producing polished object and polishing composition kit
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Application No.: US14910803Application Date: 2014-06-12
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Publication No.: US09685343B2Publication Date: 2017-06-20
- Inventor: Makoto Tabata , Shinichiro Takami , Shogaku Ide
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Kiyosu-Shi
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Kiyosu-Shi
- Agency: Foley & Lardner LLP
- Priority: JP2013-166142 20130809
- International Application: PCT/JP2014/065650 WO 20140612
- International Announcement: WO2015/019706 WO 20150212
- Main IPC: H01L21/306
- IPC: H01L21/306 ; C09G1/02 ; H01L21/02 ; C09K3/14 ; B24B37/28

Abstract:
[Problem] To provide a method for producing a polished object, which can remarkably reduce a haze level on a surface of the object to be polished while defects are significantly reduced.[Solution] A method for producing a polished object, which includes a double-side polishing step in which an object to be polished is subjected to double-side polishing using a double-side polishing composition including first abrasive grains having an average primary particle diameter of 40 nm or more and a nitrogen-containing water-soluble polymer to obtain a double-side polished object; and a single-side polishing step in which the double-side polished object is subjected to single-side polishing using a single-side polishing composition including second abrasive grains having an average primary particle diameter of 40 nm or less and a water-soluble polymer, and in which a ratio of an average primary particle diameter (A) of the first abrasive grains with respect to an average primary particle diameter (B) of the second abrasive grains (A)/(B) is more than 1 and 2.5 or less.
Public/Granted literature
- US20160189973A1 METHOD FOR PRODUCING POLISHED OBJECT AND POLISHING COMPOSITION KIT Public/Granted day:2016-06-30
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