公开(公告)号：US12139643B2

公开(公告)日：2024-11-12

申请号：US18529763

申请日：2023-12-05

Applicant: FUJIMI INCORPORATED

Inventor： Yuichiro Nakagai ,  Yasuaki Ito ,  Hiroyuki Oda ,  Shogaku Ide ,  Shinichiro Takami

IPC: C09G1/02 ,  B24B37/04 ,  H01L21/02

Abstract: Provided is a polishing composition containing an abrasive, permanganate, an aluminum salt, and water. In the polishing composition, a relation of a content W1 [% by weight] of the abrasive, a concentration C1 [mM] of the permanganate, and a concentration C2 [mM] of the aluminum salt satisfies at least one condition of the following conditions [A], [B], and [C]: satisfying both of 500≤(C1/W1) and 0.04≤(C2/C1);  [A] satisfying both of 200≤(C1/√(W1)) and 8≤C2; and  [B] satisfying both of 500≤(C1/W1) and 8≤C2.  [C]

公开(公告)号：US12110422B2

公开(公告)日：2024-10-08

申请号：US18529465

申请日：2023-12-05

Applicant: FUJIMI INCORPORATED

Inventor： Yuichiro Nakagai ,  Hiroyuki Oda ,  Yasuaki Ito ,  Shogaku Ide ,  Shinichiro Takami

IPC: C09G1/02

CPC classification number: C09G1/02

Abstract: Provided are a polishing method and a polishing composition that are applied to polishing of silicon carbide and allows reduction of rise in pH of the polishing composition and increase in pad temperature during polishing Provided is a method of polishing an object to be polished having a surface formed of silicon carbide. The method includes steps of preparing a polishing composition, and supplying the polishing composition to the object to be polished and polishing the object to be polished. The polishing composition contains permanganate, a metal salt A, and water. The metal salt A is a salt of a metal cation having a pKa of less than 7.0 in form of a hydrated metal ion, and an anion.

公开(公告)号：US09685343B2

公开(公告)日：2017-06-20

申请号：US14910803

申请日：2014-06-12

Applicant: FUJIMI INCORPORATED

Inventor： Makoto Tabata ,  Shinichiro Takami ,  Shogaku Ide

IPC: H01L21/306 ,  C09G1/02 ,  H01L21/02 ,  C09K3/14 ,  B24B37/28

CPC classification number: H01L21/30625 ,  B24B37/28 ,  C09G1/02 ,  C09K3/1409 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/02024

Abstract: [Problem] To provide a method for producing a polished object, which can remarkably reduce a haze level on a surface of the object to be polished while defects are significantly reduced.[Solution] A method for producing a polished object, which includes a double-side polishing step in which an object to be polished is subjected to double-side polishing using a double-side polishing composition including first abrasive grains having an average primary particle diameter of 40 nm or more and a nitrogen-containing water-soluble polymer to obtain a double-side polished object; and a single-side polishing step in which the double-side polished object is subjected to single-side polishing using a single-side polishing composition including second abrasive grains having an average primary particle diameter of 40 nm or less and a water-soluble polymer, and in which a ratio of an average primary particle diameter (A) of the first abrasive grains with respect to an average primary particle diameter (B) of the second abrasive grains (A)/(B) is more than 1 and 2.5 or less.