- 专利标题: Method for manufacture of fine line circuitry
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申请号: US14373961申请日: 2013-02-06
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公开(公告)号: US09713266B2公开(公告)日: 2017-07-18
- 发明人: Richard Nichols , Don Jang , Harald Riebel , Frank Brüning
- 申请人: Atotech Deutschland GmbH
- 申请人地址: DE Berlin
- 专利权人: Atotech Deutschland GmbH
- 当前专利权人: Atotech Deutschland GmbH
- 当前专利权人地址: DE Berlin
- 代理机构: Renner, Otto, Boisselle & Sklar, LLP
- 优先权: EP12075035 20120329
- 国际申请: PCT/EP2013/052318 WO 20130206
- 国际公布: WO2013/143732 WO 20131003
- 主分类号: C25D5/56
- IPC分类号: C25D5/56 ; C25D7/00 ; H05K3/38 ; H05K3/42 ; C25D5/02 ; H05K3/46 ; C23C18/40 ; C25D7/06 ; H05K3/06 ; C23C18/16 ; C23C18/20 ; H05K3/10 ; C25D3/38 ; C23C18/30
摘要:
The present invention relates to a method for manufacture of fine line circuitry in the manufacture of printed circuit boards, IC substrates and the like. The method utilizes a first conductive layer on the smooth surface of a build-up layer and a second conductive layer selected from electrically conductive polymers, colloidal noble metals and electrically conductive carbon particles on the roughened walls of at least one opening which are formed after depositing the first conductive layer.
公开/授权文献
- US20150083602A1 METHOD FOR MANUFACTURE OF FINE LINE CIRCUITRY 公开/授权日:2015-03-26
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