Invention Grant
- Patent Title: Method and apparatus for determining process rate
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Application No.: US14862983Application Date: 2015-09-23
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Publication No.: US09735069B2Publication Date: 2017-08-15
- Inventor: Yassine Kabouzi , Luc Albarede , Andrew D. Bailey, III , Jorge Luque , Seonkyung Lee , Thorsten Lill
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Beyer Law Group LLP
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/461 ; B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00 ; H01L21/66 ; H01L21/3065 ; H01L21/311 ; H01L21/308 ; H01L21/3105
Abstract:
A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.
Public/Granted literature
- US20170084503A1 METHOD AND APPARATUS FOR DETERMINING PROCESS RATE Public/Granted day:2017-03-23
Information query
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