Invention Grant
- Patent Title: High reliability field effect power device and manufacturing method thereof
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Application No.: US15238492Application Date: 2016-08-16
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Publication No.: US09780176B2Publication Date: 2017-10-03
- Inventor: Jong Min Lee , Byoung-Gue Min , Hyung Sup Yoon , Dong Min Kang , Dong-Young Kim , Seong-Il Kim , Hae Cheon Kim , Jae Won Do , Ho Kyun Ahn , Sang-Heung Lee , Jong-Won Lim , Hyun Wook Jung , Kyu Jun Cho , Chull Won Ju
- Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Applicant Address: KR Daejeon
- Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee Address: KR Daejeon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2015-0155050 20151105; KR10-2016-0084160 20160704
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/20 ; H01L29/205 ; H01L29/778 ; H01L29/66

Abstract:
The present invention relates to a high reliability field effect power device and a manufacturing method thereof. A method of manufacturing a field effect power device includes sequentially forming a transfer layer, a buffer layer, a barrier layer and a passivation layer on a substrate, patterning the passivation layer by etching a first region of the passivation layer, and forming at least one electrode on the first region of the barrier layer exposed by patterning the passivation layer, wherein the first region is provided to form the at least one electrode, and the passivation layer may include a material having a wider bandgap than the barrier layer to prevent a trapping effect and a leakage current of the field effect power device.
Public/Granted literature
- US20170133471A1 HIGH RELIABILITY FIELD EFFECT POWER DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2017-05-11
Information query
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