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公开(公告)号：US20140167175A1
公开(公告)日：2014-06-19
申请号：US13914713
申请日：2013-06-11
Inventor： Seong-Il KIM , Jong-Won Lim , Dong Min Kang , Sang-Heung Lee , Hyung Sup Yoon , Chull Won Ju , Byoung-Gue Min , Jongmin Lee , Jae Kyoung Mun , Eun Soo Nam
IPC: H01L27/088 , H01L29/66
CPC classification number: H01L29/66477 , H01L29/1608 , H01L29/2003 , H01L29/40 , H01L29/401 , H01L29/402 , H01L29/41 , H01L29/42312 , H01L29/42316 , H01L29/42376 , H01L29/66462 , H01L29/7787 , H01L29/812
Abstract: A field effect transistor is provided. The transistor may include a source electrode and a drain electrode provided spaced apart from each other on a substrate and a ‘+’-shaped gate electrode provided on a portion of the substrate located between the source and drain electrodes.
Abstract translation: 提供场效应晶体管。 晶体管可以包括在基板上彼此间隔开设置的源电极和漏电极，以及设置在位于源极和漏极之间的基板的一部分上的“+”形栅电极。
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公开(公告)号：US20140159050A1
公开(公告)日：2014-06-12
申请号：US13935096
申请日：2013-07-03
Inventor： Hyung Sup YOON , Byoung-Gue Min , Jong-Won Lim , Hokyun Ahn , Seong-ll Kim , Sang-Heung Lee , Dong Min Kang , Chull Won Ju , Jae Kyoung Mun
IPC: H01L29/778 , H01L29/66
CPC classification number: H01L29/66462 , H01L21/02118 , H01L21/0217 , H01L21/02178 , H01L21/0254 , H01L21/28264 , H01L21/28593 , H01L21/31111 , H01L21/31144 , H01L29/2003 , H01L29/201 , H01L29/205 , H01L29/404 , H01L29/42316 , H01L29/42376 , H01L29/778 , H01L29/7786
Abstract: A field effect transistor is provided. The field effect transistor may include a capping layer on a substrate, a source ohmic electrode and a drain ohmic electrode on the capping layer, a first insulating layer and a second insulating layer stacked on the capping layer to cover the source and drain ohmic electrodes, a Γ-shaped gate electrode including a leg portion and a head portion, the leg portion being connected to the substrate between the source ohmic electrode and the drain ohmic electrode, and the head portion extending from the leg portion to cover a top surface of the second insulating layer, a first planarization layer on the second insulating layer to cover the Γ-shaped gate electrode, and a first electrode on the first planarization layer, the first electrode being connected to the source ohmic electrode or the drain ohmic electrode.
Abstract translation: 提供场效应晶体管。 场效应晶体管可以包括衬底上的覆盖层，覆盖层上的源欧姆电极和漏极欧姆电极，堆叠在覆盖层上以覆盖源极和漏极欧姆电极的第一绝缘层和第二绝缘层， 包括脚部和头部的栅格电极，所述脚部分连接到所述源欧姆电极和所述漏极欧姆电极之间的衬底，并且所述头部从所述腿部延伸以覆盖所述源极欧姆电极和所述漏极欧姆电极的顶表面 所述第二绝缘层，在所述第二绝缘层上覆盖所述栅格电极的第一平坦化层和所述第一平坦化层上的第一电极，所述第一电极连接到所述源欧姆电极或所述漏极欧姆电极。
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公开(公告)号：US09837719B2
公开(公告)日：2017-12-05
申请号：US15229891
申请日：2016-08-05
Inventor： Dong-Young Kim , Dong Min Kang , Seong-Il Kim , Hae Cheon Kim , Jae Won Do , Byoung-Gue Min , Ho Kyun Ahn , Hyung Sup Yoon , Sang-Heung Lee , Jong Min Lee , Jong-Won Lim , Yoo Jin Jang , Hyun Wook Jung , Kyu Jun Cho , Chull Won Ju
CPC classification number: H01Q9/0407 , H01Q1/50 , H01Q9/0442
Abstract: Provided herein is a patch antenna including a multilayered substrate on which a plurality of dielectric layers are laminated; at least one metal pattern layer disposed between the plurality of dielectric layers outside a central area of the multilayered substrate; an antenna patch disposed on an upper surface of the multilayered substrate and within the central area; a ground layer disposed on a lower surface of the multilayered substrate; a plurality of connection via patterns penetrating the plurality of dielectric layers to connect the metal pattern layer and the ground layer, and surrounding the central area; a transmission line comprising a first transmission line unit disposed on the upper surface of the multilayered substrate and located outside the central area, and a second transmission line unit disposed on the upper surface of the multilayered substrate and located within the central area; and an impedance transformer located below the second transmission line unit within the central area of the multilayered substrate.
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4.发明授权公开(公告)号：US08841154B2
公开(公告)日：2014-09-23
申请号：US13916006
申请日：2013-06-12
Inventor： Hyung Sup Yoon , Byoung-Gue Min , Jong-Won Lim , Ho Kyun Ahn , Jong Min Lee , Seong-il Kim , Jae Kyoung Mun , Eun Soo Nam
CPC classification number: H01L21/28008 , H01L21/28587 , H01L29/42316 , H01L29/66863
Abstract: Disclosed is a method of manufacturing a field effect type compound semiconductor device in which leakage current of a device is decreased and breakdown voltage is enhanced. The method of manufacturing a field effect type compound semiconductor device includes: stacking an active layer and an ohmic layer on a substrate and forming a first oxide layer on the ohmic layer; forming a mesa region in predetermined regions of the first oxide layer, the ohmic layer, and the active layer; planarizing the mesa region after forming a nitride layer by evaporating a nitride on the mesa region; forming an ohmic electrode on the first oxide layer; forming a minute gate resist pattern after forming a second oxide layer on a semiconductor substrate in which the ohmic electrode is formed and forming a minute gate pattern having a under-cut shaped profile by dry-etching the first oxide layer, the nitride layer, and the second oxide layer; forming a gate recess region by forming a head pattern of a gamma gate electrode on the semiconductor substrate; and forming the gamma gate electrode by evaporating refractory metal on the semiconductor substrate in which the gate recess region is formed.
Abstract translation: 公开了一种制造场效应型化合物半导体器件的方法，其中器件的漏电流降低并且击穿电压增强。 制造场效应型化合物半导体器件的方法包括：在衬底上堆叠有源层和欧姆层，并在欧姆层上形成第一氧化物层; 在所述第一氧化物层，所述欧姆层和所述有源层的预定区域中形成台面区域; 通过在台面区域上蒸发氮化物，在形成氮化物层之后使台面区域平坦化; 在所述第一氧化物层上形成欧姆电极; 在形成欧姆电极的半导体衬底上形成第二氧化物层之后形成微小栅极抗蚀剂图案，并通过干蚀刻第一氧化物层，氮化物层和形成具有下切形状轮廓的微小栅极图案 第二氧化物层; 通过在所述半导体衬底上形成伽马栅电极的头部图形来形成栅极凹部区域; 以及通过在形成有所述栅极凹部的所述半导体衬底上蒸发难熔金属而形成所述γ栅电极。
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公开(公告)号：US20140152338A1
公开(公告)日：2014-06-05
申请号：US13950939
申请日：2013-07-25
Inventor： Jongmin LEE , Byoung-Gue Min , Chull Won Ju
IPC: G01R31/26
CPC classification number: G01R31/2608 , G01R31/2621 , G01R31/2632
Abstract: Provided is a low-cost and high-efficient system for measuring reliability of an electronic device. According to the present invention, a single input power source for applying power to an input terminal of a plurality of electronic device samples and a single output power source for applying power to an output terminal of the plurality of electronic device samples are provided. Further, an input switch having first switches of which the number corresponds to the number of the plurality of electronic device samples, the input switch being installed between the input power source and the input terminal so that the first switches are selectively switched to apply input power; and an output switch having second switches of which the number corresponds to the number of the plurality of electronic device samples, the output switch being installed between the output power source and the output terminal so that the second switches are selectively switched to apply output power are provided.
Abstract translation: 提供了用于测量电子设备的可靠性的低成本和高效率的系统。 根据本发明，提供了用于向多个电子设备样本的输入端施加电力的单个输入电源和用于向多个电子设备样本的输出端施加电力的单个输出电源。 此外，具有第一开关的输入开关，其数量对应于多个电子设备样本的数量，输入开关安装在输入电源和输入端子之间，使得第一开关被选择性地切换以施加输入功率 ; 以及具有第二开关的输出开关，其数量对应于多个电子设备样本的数量，输出开关安装在输出电源和输出端子之间，使得第二开关选择性地切换以施加输出功率 提供。
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Patent Agency Ranking
公开(公告)号：US09780176B2
公开(公告)日：2017-10-03
申请号：US15238492
申请日：2016-08-16
Inventor： Jong Min Lee , Byoung-Gue Min , Hyung Sup Yoon , Dong Min Kang , Dong-Young Kim , Seong-Il Kim , Hae Cheon Kim , Jae Won Do , Ho Kyun Ahn , Sang-Heung Lee , Jong-Won Lim , Hyun Wook Jung , Kyu Jun Cho , Chull Won Ju
IPC: H01L29/40 , H01L29/20 , H01L29/205 , H01L29/778 , H01L29/66
CPC classification number: H01L29/408 , H01L29/2003 , H01L29/205 , H01L29/66462 , H01L29/7786 , H01L29/7787
Abstract: The present invention relates to a high reliability field effect power device and a manufacturing method thereof. A method of manufacturing a field effect power device includes sequentially forming a transfer layer, a buffer layer, a barrier layer and a passivation layer on a substrate, patterning the passivation layer by etching a first region of the passivation layer, and forming at least one electrode on the first region of the barrier layer exposed by patterning the passivation layer, wherein the first region is provided to form the at least one electrode, and the passivation layer may include a material having a wider bandgap than the barrier layer to prevent a trapping effect and a leakage current of the field effect power device.
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公开(公告)号：US09136396B2
公开(公告)日：2015-09-15
申请号：US13905213
申请日：2013-05-30
Inventor： Sang Choon Ko , Jae Kyoung Mun , Byoung-Gue Min , Young Rak Park , Hokyun Ahn , Jeong-Jin Kim , Eun Soo Nam
IPC: H01L29/66 , H01L29/808 , H01L29/417 , H01L29/778 , H01L29/43 , H01L29/45 , H01L29/20
CPC classification number: H01L29/808 , H01L21/76898 , H01L29/2003 , H01L29/4175 , H01L29/41758 , H01L29/432 , H01L29/454 , H01L29/66462 , H01L29/7786
Abstract: A method of manufacturing a semiconductor device includes forming devices including source, drain and gate electrodes on a front surface of a substrate including a bulk silicon, a buried oxide layer, an active silicon, a gallium nitride layer, and an aluminum-gallium nitride layer sequentially stacked, etching a back surface of the substrate to form a via-hole penetrating the substrate and exposing a bottom surface of the source electrode, conformally forming a ground interconnection on the back surface of the substrate having the via-hole, forming a protecting layer on the front surface of the substrate, and cutting the substrate to separate the devices from each other.
Abstract translation: 一种制造半导体器件的方法包括在包括体硅，掩埋氧化物层，活性硅，氮化镓层和铝 - 氮化镓层的衬底的前表面上形成包括源极，漏极和栅电极的器件 依次堆叠，蚀刻基板的背面以形成穿透基板的通孔并暴露源电极的底表面，在具有通孔的基板的背面上共形形成接地互连，形成保护 层，并且切割基板以将装置彼此分离。
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公开(公告)号：US10608102B2
公开(公告)日：2020-03-31
申请号：US16137235
申请日：2018-09-20
Inventor： Hokyun Ahn , Min Jeong Shin , Jeong Jin Kim , Hae Cheon Kim , Jae Won Do , Byoung-Gue Min , Hyung Sup Yoon , Hyung Seok Lee , Jong-Won Lim , Sungjae Chang , Hyunwook Jung , Kyu Jun Cho , Dong Min Kang , Dong-Young Kim , Seong-Il Kim , Sang-Heung Lee , Jongmin Lee , Hong Gu Ji
IPC: H01L29/78 , H01L29/45 , H01L29/778 , H01L29/66 , H01L21/3065 , H01L29/417 , H01L29/06 , H01L29/20 , H01L29/423
Abstract: Provided is a semiconductor device including a substrate in which an insulation layer is disposed between a first semiconductor layer and a second semiconductor layer, a through-hole penetrating through the substrate, the through-hole having a first hole penetrating through the first semiconductor layer and a second hole penetrating through the insulation layer and the second semiconductor layer from a bottom surface of the first hole, an epi-layer disposed inside the through-hole, a drain electrode disposed inside the second hole and contacting one surface of the epi-layer, and a source electrode and a gate electrode which are disposed on the other surface of the epi-layer.
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公开(公告)号：US10256811B2
公开(公告)日：2019-04-09
申请号：US15654792
申请日：2017-07-20
Inventor： Woojin Chang , Jong-Won Lim , Dong Min Kang , Dong-Young Kim , Seong-il Kim , Hae Cheon Kim , Jae Won Do , Byoung-Gue Min , Min Jeong Shin , Hokyun Ahn , Hyung Sup Yoon , Sang-Heung Lee , Jongmin Lee , Sungjae Chang , Yoo Jin Jang , Hyunwook Jung , Kyu Jun Cho , Hong Gu Ji
IPC: H03K17/687 , H03K17/693 , G11C5/14 , H03K19/0175 , H03K3/353 , H03K17/0812 , H03K17/10 , H03K17/12 , H03K17/14 , H03K17/16 , H03K17/28
Abstract: Provided is a cascode circuit including first and second transistors connected between a drain terminal and a source terminal in cascode form, a level sifter configured to change a voltage level of a switching control signal applied to a gate terminal and provide the changed switching control signal to a gate of the first transistor, a buffer configured to delay the switching control signal and provide the delayed switching control signal to a gate of the second transistor, and a first resistor connected between the level shifter and the gate of the first transistor.
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公开(公告)号：US09224830B2
公开(公告)日：2015-12-29
申请号：US13914713
申请日：2013-06-11
Inventor： Seong-Il Kim , Jong-Won Lim , Dong Min Kang , Sang-Heung Lee , Hyung Sup Yoon , Chull Won Ju , Byoung-Gue Min , Jongmin Lee , Jae Kyoung Mun , Eun Soo Nam
IPC: H01L29/812 , H01L29/66 , H01L29/40 , H01L29/41 , H01L29/423 , H01L29/778 , H01L29/16 , H01L29/20
CPC classification number: H01L29/66477 , H01L29/1608 , H01L29/2003 , H01L29/40 , H01L29/401 , H01L29/402 , H01L29/41 , H01L29/42312 , H01L29/42316 , H01L29/42376 , H01L29/66462 , H01L29/7787 , H01L29/812
Abstract: A field effect transistor is provided. The transistor may include a source electrode and a drain electrode provided spaced apart from each other on a substrate and a ‘+’-shaped gate electrode provided on a portion of the substrate located between the source and drain electrodes.
Abstract translation: 提供场效应晶体管。 晶体管可以包括在基板上彼此间隔开设置的源电极和漏电极，以及设置在位于源极和漏极之间的基板的一部分上的“+”形栅电极。
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