Invention Grant
- Patent Title: Method for monitoring usage of a physical vapor deposition (PVD) target with an ultrasonic transducer
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Application No.: US14750148Application Date: 2015-06-25
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Publication No.: US09791415B2Publication Date: 2017-10-17
- Inventor: Tsung-Jen Yang , Cheng-Chieh Chen , Hong-Hsing Chou
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: C23C14/00
- IPC: C23C14/00 ; G01N29/07 ; C23C14/54 ; G01B17/02 ; G01N29/032 ; G01N29/11 ; C23C14/34 ; C23C16/52 ; H01J37/32 ; H01J37/34

Abstract:
A system for semiconductor manufacturing that uses ultrasonic waves for estimating and monitoring a remaining service lifetime of a consumable element is provided. A consumable element comprises a front side arranged inside a process chamber and a back side, opposite the front side, arranged outside the process chamber. An ultrasonic transducer is arranged on the back side of the consumable element, and directed towards the front side of the consumable element. A monitoring unit is configured to estimate and monitor a remaining service lifetime of the consumable element using the ultrasonic transducer. A method for estimating and monitoring the remaining service lifetime of the consumable element using ultrasonic waves is also provided.
Public/Granted literature
- US20160376695A1 METHOD FOR MONITORING USAGE OF A PHYSICAL VAPOR DEPOSITION (PVD) TARGET WITH AN ULTRASONIC TRANSDUCER Public/Granted day:2016-12-29
Information query
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