- Patent Title: Monitoring system for deposition and method of operation thereof
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Application No.: US14839656Application Date: 2015-08-28
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Publication No.: US09870935B2Publication Date: 2018-01-16
- Inventor: Edward W. Budiarto , Majeed A. Foad , Ralf Hofmann , Thomas Nowak , Todd Egan , Mehdi Vaez-Iravani
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/67 ; H01L21/02 ; H01L21/033 ; H01L21/285 ; H01L21/66
Abstract:
A monitoring and deposition control system and method of operation thereof including: a deposition chamber for depositing a material layer on a substrate; a sensor array for monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and a processing unit for adjusting deposition parameters based on the changes in the layer thickness during deposition.
Public/Granted literature
- US20160181134A1 MONITORING SYSTEM FOR DEPOSITION AND METHOD OF OPERATION THEREOF Public/Granted day:2016-06-23
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