Invention Grant
- Patent Title: Deposition methods for uniform and conformal hybrid titanium oxide films
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Application No.: US15184521Application Date: 2016-06-16
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Publication No.: US09881787B2Publication Date: 2018-01-30
- Inventor: Chien-Teh Kao , Benjamin Schmiege , Xuesong Lu , Juno Yu-Ting Huang , Yu Lei , Yung-Hsin Lee , Srinivas Gandikota , Rajkumar Jakkaraju , Chikuang Charles Wang , Ghazal Saheli , Benjamin C. Wang , Xinliang Lu , Pingyan Lei
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/311
Abstract:
Methods for depositing titanium oxide films by atomic layer deposition are disclosed. Titanium oxide films may include a titanium nitride cap, an oxygen rich titanium nitride cap or a mixed oxide nitride layer. Also described are methods for self-aligned double patterning including titanium oxide spacer films.
Public/Granted literature
- US20160372324A1 Deposition Methods For Uniform And Conformal Hybrid Titanium Oxide Films Public/Granted day:2016-12-22
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