Invention Grant
- Patent Title: SRAM cell for interleaved wordline scheme
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Application No.: US15222914Application Date: 2016-07-28
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Publication No.: US09886996B2Publication Date: 2018-02-06
- Inventor: Hidehiro Fujiwara , Hung-Jen Liao , Hsien-Yu Pan , Yen-Huei Chen , Mahmut Sinangil
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: G11C11/412
- IPC: G11C11/412 ; G11C11/418 ; H01L27/11 ; G11C11/419 ; G11C8/14

Abstract:
In some embodiments, the present disclosure relates to a static random access memory (SRAM) device. The SRAM device includes a plurality of SRAM cells arranged in a plurality of rows and a plurality of columns, wherein respective SRAM cells include respective pairs of complementary data storage nodes to store respective data states. A first pair of access transistors is coupled to the complementary data storage nodes of an SRAM cell and is configured to selectively couple the complementary data storage nodes to a first pair of complementary bitlines, respectively. A second pair of access transistors is coupled to the complementary data storage nodes of the SRAM cell and is configured to selectively couple the complementary data storage nodes to a second pair of complementary bitlines, respectively.
Public/Granted literature
- US20170110181A1 SRAM CELL FOR INTERLEAVED WORDLINE SCHEME Public/Granted day:2017-04-20
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