Invention Grant
- Patent Title: Nitride-based III-V group compound semiconductor
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Application No.: US14689892Application Date: 2015-04-17
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Publication No.: US09911894B2Publication Date: 2018-03-06
- Inventor: Akira Ohmae , Michinori Shiomi , Noriyuki Futagawa , Takaaki Ami , Takao Miyajima , Yuuji Hiramatsu , Izuho Hatada , Nobukata Okano , Shigetaka Tomiya , Katsunori Yanashima , Tomonori Hino , Hironobu Narui
- Applicant: Sony Corporation
- Applicant Address: JP Tokyo
- Assignee: SONY CORPORATION
- Current Assignee: SONY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Dentons US LLP
- Priority: JP2005-275504 20050922; JP2006-215342 20060808
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L31/0328 ; C30B23/04 ; C30B25/04 ; C30B29/40 ; H01L21/02 ; H01L33/08 ; H01L27/15 ; H01L33/24 ; H01L33/32 ; H01L33/12 ; H01L33/22 ; H01L33/46

Abstract:
A method for manufacturing a light-emitting diode, which includes the steps of: providing a substrate having a plurality of protruded portions on one main surface thereof wherein the protruded portion is made of a material different in type from that of the substrate and growing a first nitride-based III-V Group compound semiconductor layer on each recess portion of the substrate through a state of making a triangle in section wherein a bottom surface of the recess portion becomes a base of the triangle; laterally growing a second nitride-based III-V Group compound semiconductor layer on the substrate from the first nitride-based III-V Group compound semiconductor layer; and successively growing, on the second nitride-based III-V Group compound semiconductor layer, a third nitride-based III-V Group compound semiconductor layer of a first conduction type, an active layer, and a fourth nitride-based III-V compound semiconductor layer of a second conduction type.
Public/Granted literature
- US20150228846A1 METHOD FOR GROWING A NITRIDE-BASED III-V GROUP COMPOUND SEMICONDUCTOR Public/Granted day:2015-08-13
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