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公开(公告)号：EP3221747A2
公开(公告)日：2017-09-27
申请号：EP15794591.6
申请日：2015-11-16
发明人： KRUIZINGA, Matthias , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BOGAART, Erik Willem , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , BRULS, Richard Joseph , DEKKERS, Jeroen , JANSSEN, Paul , KAMALI, Mohammad Reza , KRAMER, Ronald Harm Gunther , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LIPSON, Matthew , LOOPSTRA, Erik Roelof , LYONS, Joseph H. , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译： 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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公开(公告)号：EP3371655A1
公开(公告)日：2018-09-12
申请号：EP16785484.3
申请日：2016-10-25
CPC分类号： G03F7/70983 , B82Y40/00 , G03F1/24 , G03F1/62 , G03F1/64 , G03F7/70916 , G03F7/70958 , G21K2201/067
摘要： A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
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公开(公告)号：EP3254157A2
公开(公告)日：2017-12-13
申请号：EP16702142.7
申请日：2016-02-01
发明人： BROUNS, Derk Servatius Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus Cornelis Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud Willem , SMITH, Daniel Andrew , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , WILEY, James Norman
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：EP3221748A2
公开(公告)日：2017-09-27
申请号：EP15794923.1
申请日：2015-11-16
发明人： VAN DER MEULEN, Frits , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald Harm Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LOOPSTRA, Erik Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , DE KLERK, Angelo Cesar Peter , DINGS, Jacobus Maria , JANSSEN, Maurice Leonardus Johannes , KERSTENS, Roland Jacobus Johannes , KESTERS, Martinus Jozef Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester Matheus , THEUERZEIT, Frank Johannes Christiaan , VAN LIEVENOOGEN, Anne Johannes Wilhelmus
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译： 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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