摘要:
A photocurable composition contains a polymerizable compound; and a photopolymerization initiator, in which the photocurable composition contains a compound represented by General Formula (1) shown below as the polymerizable compound, and in which, in General Formula (1), Ar represents a monovalent aromatic group which may have a substituent, R1 represents an alkyl group which may have a substituent or a hydrogen atom, R2 represents an alkyl group having (m + n) valences which may have a substituent, m is an integer of 2 or more, and n is an integer of 1 or more.
摘要:
In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.
摘要:
An imprint method that uses a condensable gas process has a problem in that the surface of a resist cured film is rough. This is resolved by a photocurable composition used for performing imprint in an atmosphere containing a condensable gas. The photocurable composition contains a component (A) which is a (meth)acrylate monomer, a component (B) which is a photopolymerization initiator, and a component (C) which is a mold releasing agent. A saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 5% by weight or less, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.
摘要:
A photocurable composition contains a polymerizable compound (A) satisfying OA=NA/(NC,A−NO,A), wherein NA, NC,A and NO,A represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in (A); and a non-polymerizable component (E) containing at least one compound (X) including a photopolymerization initiator (B), in a proportion of 10% to 50% relative to the total weight of (A) and (E). The component (E) has a weight average molecular weight of 250 or less. The compound (X) satisfies OX=NX/(NC,X−NO,X). NX, NC,X and NO,X represent the total number of atoms, the number of carbon atoms, and the number of oxygen atoms, respectively, in the corresponding compound (X). The composition satisfies: OA−OE>1.00; and OAE
标题翻译:HÄRTBAREZUSAMMENSETZUNG ZURLICHTPRÄGUNGUND VERFAHREN ZUR HERSTELLUNG EINES FILMS,OPTISCHE KOMPONENTE,LEITERPLATTE ODER ELEKTRONISCHE KOMPONENTE UNTER VERWENDUNG DER ZUSAMMENSETZUNG
摘要:
A curable composition for photoimprint at least includes a polymerizable compound component (A) and a photopolymerization initiator component (B) and satisfies expression (1) and (2): 0.800≦Er10/Er200 (1) 2.55≦Er10 (2) wherein, Er10 represents the reduced modulus (GPa) of a photocured film prepared by exposing a film of the curable composition for photoimprint to light of 10 mJ/cm2; and Er200 represents the reduced modulus (GPa) of a photocured film prepared by exposing a film of the curable composition for photoimprint to light of 200 mJ/cm2.
摘要翻译:一种光压印用固化性组合物,其特征在于,至少含有聚合性化合物成分(A)和光聚合引发剂成分(B),满足式(1)和(2):0.800≤Er10/ Er200(1)2.55≤Er10(2) Er10表示通过将用于光压印的可固化组合物的膜暴露于10mJ / cm 2的光而制备的光固化膜的折合模量(GPa) 并且Er200表示通过将用于光压印的可固化组合物的膜暴露于200mJ / cm 2的光而制备的光固化膜的还原模量(GPa)。