摘要:
A lithographic stage includes a platen (31) having a top face and a bottom face and a holder (32) for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.
摘要:
A titania precursor (18) and a silica precursor (6) are mixed in a manifold (14) and are fed to a burner (28) to create soot (40) which is deposited on a deposition surface (34) which is rotated and elevated. The end product is useful for Extreme UV lithography.