公开(公告)号：EP1390309A4

公开(公告)日：2004-12-08

申请号：EP02723639

申请日：2002-03-25

申请人： CORNING INC

发明人： ACKERMAN BRADFORD G ,  HRDINA KENNETH E ,  MOORE LISA A ,  RUSSO NIKKI J ,  YU CHUNZHE C

IPC分类号： G03F1/16 ,  C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C3/076 ,  G02B1/00 ,  G03F7/20 ,  H01L21/027 ,  C03B37/014

CPC分类号： C03C4/0085 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/62 ,  C03B2207/70 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/40 ,  Y02P40/57

摘要： A titania precursor (18) and a silica precursor (6) are mixed in a manifold (14) and are fed to a burner (28) to create soot (40) which is deposited on a deposition surface (34) which is rotated and elevated. The end product is useful for Extreme UV lithography.

摘要翻译： 一种用于制造熔凝石英玻璃含二氧化钛的方法包括二氧化硅和二氧化钛的合成颗粒，通过连续沉积在沉积表面上的颗粒和二氧化钛前体的二氧化硅前体的混合物输送到燃烧器，生长的多孔预成型件，同时旋转和平移 相对沉积表面到燃烧器，并且巩固多孔预成致密的玻璃。

公开(公告)号：EP1224047A4

公开(公告)日：2004-11-17

申请号：EP00937499

申请日：2000-02-17

申请人： CORNING INC

发明人： HRDINA KENNETH E ,  KAR GITIMOY ,  WIGHT JOHN F ,  YU CHUNZHE C

IPC分类号： B28B3/20 ,  B28B11/00 ,  C03B19/06 ,  C03B23/047 ,  C03B23/06 ,  C03B32/00 ,  C03B37/012 ,  G02B6/02 ,  B23B1/00

CPC分类号： G02B6/02347 ,  B28B3/269 ,  B28B11/003 ,  C03B19/025 ,  C03B19/06 ,  C03B23/047 ,  C03B23/065 ,  C03B32/00 ,  C03B37/0124 ,  C03B2203/42 ,  G02B6/02361 ,  G02B6/02371 ,  G02B6/02376 ,  Y10T428/236 ,  Y10T428/24149

摘要： The present invention describes an extrusion process for manufacturing a titanium-containing silicate glass honeycomb structure (100), having a variety of shapes and sizes depending on its ultimate application. The titanium-containing glass honeycomb has a very low coefficient of thermal expansion (CTE) and the CTE can be varied by adjusting the titanium level to match the CTE of members that are bonded to the honeycomb. Furthermore, the inventive honeycomb structure is lightweight, yet able to advantageously used as a light-weight support for such objects as mirrors. Especially extraterrestrial environments where temperature extremes are present. These honeycombs can be used singularly or in aggregates to provide such support. Embodiments are described wherein the mass of the honeycomb is further reduced by removing select portions of the honeycomb without deleteriously impacting its ability for load bearing.

公开(公告)号：EP1177092A4

公开(公告)日：2004-11-17

申请号：EP00914628

申请日：2000-02-17

申请人： CORNING INC

发明人： HRDINA KENNETH E ,  KAR GITIMOY ,  WIGHT JOHN F JR ,  YU CHUNZHE C

IPC分类号： B01D39/20 ,  B01D63/06 ,  B01D71/02 ,  B01D71/04 ,  B28B3/20 ,  B28B3/26 ,  C02F1/32 ,  C03B19/06 ,  C03B20/00 ,  C03B23/047 ,  C03B23/06 ,  C03B23/09 ,  C03B32/00 ,  C03B37/012 ,  C03C3/06 ,  C03C3/097 ,  C04B35/00 ,  C04B35/16 ,  G02B6/02 ,  B23B1/00 ,  B28B11/00

CPC分类号： G02B6/02347 ,  B01D63/066 ,  B01D71/027 ,  B01D71/04 ,  C02F1/32 ,  C03B19/025 ,  C03B19/06 ,  C03B23/047 ,  C03B23/06 ,  C03B23/065 ,  C03B32/00 ,  C03B37/0124 ,  C03B2203/14 ,  C03B2203/42 ,  G02B6/02357 ,  G02B6/02371 ,  G02B6/02376 ,  Y10T428/24149 ,  Y10T428/24165

摘要： The present invention describes a glass honeycomb structure (100) having a variety of shapes and sizes depending on its ultimate application. Unlike prior art honeycomb structures made from ceramics, the inventive glass honeycomb can be readily bent and/or redrawn. Furthermore, the inventive honeycomb structure is light-weight, yet able to support heavy loads on its end faces (10a, 10b). Therefore, the inventive honeycomb can be used as a light-weight support for such objects as mirrors. Other useful properties of the extruded glass honeycomb are its high softening temperature, its transparency to ultraviolet and visible light, and its ability to be redrawn. Embodiments that rely upon one or more of these properties include: a bio-reactor, a membrane reactor, a capillary flow controller, a high efficiency filtration system, in-situ water treatment, high temperature dielectric material, and photonic band gap material.

公开(公告)号：EP1156988A4

公开(公告)日：2004-11-17

申请号：EP00914622

申请日：2000-02-17

申请人： CORNING INC

发明人： HRDINA KENNETH E ,  KAR GITIMOY ,  WIGHT JOHN F JR ,  YU CHUNZHE C

IPC分类号： B01D39/20 ,  B01D63/06 ,  B01D71/02 ,  B01D71/04 ,  B28B3/20 ,  B28B3/26 ,  C02F1/32 ,  C03B19/06 ,  C03B20/00 ,  C03B23/047 ,  C03B23/06 ,  C03B23/09 ,  C03B32/00 ,  C03B37/012 ,  C03C3/06 ,  C03C3/097 ,  C04B35/00 ,  C04B35/16 ,  G02B6/02 ,  B23B1/00 ,  B28B11/00

CPC分类号： G02B6/02347 ,  B01D63/066 ,  B01D71/027 ,  B01D71/04 ,  C02F1/32 ,  C03B19/025 ,  C03B19/06 ,  C03B23/047 ,  C03B23/06 ,  C03B23/065 ,  C03B32/00 ,  C03B37/0124 ,  C03B2203/14 ,  C03B2203/42 ,  G02B6/02357 ,  G02B6/02371 ,  G02B6/02376 ,  Y10T428/24149 ,  Y10T428/24165

摘要： The present invention describes an extrusion process for manufacturing a glass honeycomb structure (100) having a variety of shapes and sizes depending on its ultimate application. Unlike prior art honeycomb structures made from ceramics, the inventive glass honeycomb (100) can be readily viscously bent and/or redrawn. Furthermore, the inventive honeycomb structure (100) is light-weight, yet able to support heavy loads on its end faces (10a, 10b). Therefore, the inventive honeycomb (100) can be used as a light-weight support for such objects as mirrors. These honeycombs (100) can be used singularly or in aggregates to provide such support. Embodiments are described wherein the mass of the honeycomb (100) is further reduced by removing select portions of the honeycomb without deleteriously impacting its ability for load bearing.

公开(公告)号：EP1240556A4

公开(公告)日：2003-03-19

申请号：EP00970835

申请日：2000-10-12

申请人： CORNING INC

发明人： PRIESTLEY RICHARD S ,  SEMPOLINSKI DANIEL R ,  YU CHUNZHE C

IPC分类号： C03C3/06 ,  G03F1/50 ,  G03F1/70 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  C03C4/00 ,  G03F1/00

CPC分类号： G03F7/70566 ,  C03C3/06 ,  C03C2201/23 ,  G03F1/60

摘要： The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.