利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

64 条记录 (耗时 0.016 秒)

    Electron microscope
    5.
    发明公开
    Electron microscope 失效
    Elektronenmikroskop

    公开(公告)号：EP0758140A3

    公开(公告)日：1997-11-05

    申请号：EP96112563.0

    申请日：1996-08-02

    申请人： HITACHI, LTD.

    发明人： Takami, Sho ,  Otaka, Tadashi

    IPC分类号： H01J37/28

    CPC分类号： H01J37/28

    摘要： In the electron microscope, a degree of sample contamination caused by irradiating electron beams to a sample (4) can be suppressed to an allowable range. The electron microscope is comprised of: means (5) for directly measuring an electron beam irradiation current to a sample; time measuring means (T) for measuring irradiation time of electron beams to an observation region on the sample; and means (CPU) for calculating a dose of the electron beams irradiated to the observation region based upon the measured electron beam irradiation current, the measured electron beam irradiation time, and preset observation magnification.

    摘要翻译： 在电子显微镜中，通过向样品（4）照射电子束引起的样品污染程度可以被抑制在允许范围内。 电子显微镜包括：用于直接测量向样品的电子束照射电流的装置（5）; 时间测量装置（T），用于测量电子束对样品上观察区域的照射时间; 以及用于基于测量的电子束照射电流，测量的电子束照射时间和预设观察倍率来计算照射到观察区域的电子束的剂量的装置（CPU）。

    An electron beam apparatus
    6.
    发明公开
    An electron beam apparatus 失效
    电子束装置

    公开(公告)号：EP0641011A2

    公开(公告)日：1995-03-01

    申请号：EP94305950.1

    申请日：1994-08-11

    申请人： HITACHI, LTD.

    发明人： Todokoro, Hideo ,  Otaka, Tadashi ,  Maeda, Tatsuya ,  Sasada, Katsuhiro

    IPC分类号： H01J37/21 ,  H01J37/141

    CPC分类号： H01J37/21 ,  H01J2237/216 ,  H01J2237/2482

    摘要： An electron beam apparatus focusses an electron beam (1) onto a specimen (6) by means of an objective magnetic lens (2). In order to detect changes in the height of the specimen, a laser light beam (1) from a laser source (9) is incident on the specimen (6) and the reflected laser beam (11) is detected by a light detector (3). Any change in the height of the specimen (6) changes the path of the laser beam (11) to the detector (3). Therefore, by monitoring the detector (3), the focussing of the electron beam (1) on the specimen (6) can be controlled by varying the current to an excitation coil (31) of the objective magnetic lens (2) or by moving the specimen (6) via a mounting stage (10). At least one of the pole pieces (28,29) of the objective lens (2) is on the opposite side of the path of the laser beam to the source of the electron beam (1), so that the objective magnetic lens (2) may be close to the specimen (6), permitting a short focal length. Thus, the laser beam (11) may pass between the pole pieces (28,29). An optical microscope (39) may also be provided to permit the specimen (6) to be viewed. The viewing path of the optical microscope (39) extends through an opening (37A) in one or both of the pole pieces (28,29) of the objective magnetic lens (2).

    摘要翻译： 电子束装置借助于目标磁透镜（2）将电子束（1）聚焦到样本（6）上。 为了检测试样高度的变化，来自激光源（9）的激光束（1）入射到试样（6）上，并且反射的激光束（11）被光检测器（3） ）。 样品（6）高度的任何变化都会改变激光束（11）到探测器（3）的路径。 因此，通过监测检测器（3），可以通过改变到目标磁透镜（2）的励磁线圈（31）的电流或通过移动目标磁透镜（2）来控制电子束（1）在试样（6）上的聚焦 样本（6）经由安装台（10）移动。 物镜（2）的极片（28,29）中的至少一个位于激光束到电子束（1）的源的路径的相反侧，使得物镜磁性透镜（2 ）可能接近样品（6），允许短焦距。 因此，激光束（11）可以在极片（28,29）之间通过。 还可以提供光学显微镜（39）以允许观察样本（6）。 光学显微镜（39）的观察路径延伸穿过目标磁透镜（2）的一个或两个极片（28,29）中的开口（37A）。

    Electron beam apparatus
    7.
    发明公开
    Electron beam apparatus 失效
    电子束装置

    公开(公告)号：EP0949653A3

    公开(公告)日：2005-12-21

    申请号：EP99111213.7

    申请日：1992-11-25

    申请人： Hitachi, Ltd. ,  Hitachi Science Systems, Ltd.

    发明人： Otaka, Tadashi ,  Okura, Akimitsu ,  Iwamoto, Hiroshi ,  Todokoro, Hideo ,  Komoda, Tsutomu ,  Tobita, Issei

    IPC分类号： H01J37/28

    CPC分类号： H01J37/28 ,  H01J2237/2448 ,  H01J2237/281

    摘要： An observation method of an electron beam apparatus for obtaining a scanning image of a desired region by detecting electron generated from said desired region with a detector as a result of scanning electron beam in a desired region of a specimen surface comprises the steps of scanning electron beam in a specimen region including contact hole or a deep groove, returning back at least a part of secondary electron within electron generated in said scanning region to said specimen side by applying a negative voltage at grid electrode disposed between said specimen and said detector, and detecting a reflecting electron and said secondary electron of a higher energy among electron generated from said scanning region with said detector, whereby obtaining a specimen image including said contact hole or deep groove.

    摘要翻译： 一种电子束设备的观察方法，用于通过在样本表面的期望区域中扫描电子束来检测由所述期望区域产生的电子，从而获得期望区域的扫描图像的方法包括以下步骤：扫描电子束 在包括接触孔或深槽的样本区域中，通过在设置在所述样本和所述检测器之间的栅格电极上施加负电压，使所述扫描区域中产生的电子内的至少一部分二次电子返回到所述样本侧， 从所述扫描区域用所述检测器产生的电子中的反射电子和具有较高能量的所述二次电子，由此获得包括所述接触孔或深槽的样本图像。

    Scanning electron microscope, production method for semiconductor device by using the same, image forming method
    10.
    发明公开
    Scanning electron microscope, production method for semiconductor device by using the same, image forming method 失效
    Rasterelekronenmikroskop，Herstellungsverfahren einer Halbleitervorrichtung mittels死亡Mikroskops，Bilderzeugungsverfahren

    公开(公告)号：EP0930638A1

    公开(公告)日：1999-07-21

    申请号：EP99103918.1

    申请日：1991-10-10

    申请人： Hitachi, Ltd.

    发明人： Todokoro, Hideo ,  Takamoto, Kenji ,  Otaka, Tadashi

    IPC分类号： H01J37/28 ,  H01J37/30 ,  G01B15/00 ,  G01B15/04

    CPC分类号： G01B15/04 ,  G01B15/00 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/281

    摘要： A method for forming an image of a specimen, comprises scanning a particle beam on a scanning field including the bottom of a deep hole or groove in the surface of the specimen, said deep hole or groove having an aspect ratio of at least 3, the particle beam scanned on the bottom of the deep hole or groove thereby generating charged particles from the specimen surface and from the bottom of the deep hole or groove; detecting the charged particles generated or reflected from the specimen surface and the charged particles reflected from the bottom of the deep hole or groove or generated from the specimen surface by said charged particles reflected from the bottom, in the scanning step; and displaying the scanning field including the specimen surface and the bottom of the deep hole or groove, based on the detected charged particles.

    摘要翻译： 一种用于形成试样的图像的方法，包括在包括试样表面的深孔或凹槽的底部的扫描场上扫描粒子束，所述深孔或凹槽的纵横比至少为3， 在深孔或凹槽的底部扫描粒子束，从而从样品表面和深孔或凹槽的底部产生带电粒子; 在所述扫描步骤中检测从所述样品表面产生或反射的带电粒子以及从所述深孔或槽的底部反射的带电粒子，或者从所述底部反射的所述带电粒子从所述样品表面产生的带电粒子; 并且基于检测到的带电粒子显示包括深孔或凹槽的样本表面和底部的扫描场。