摘要:
There is provided a pellicle having a frame 12, a film 11 and an adhesive 13 for bonding the film 11 to the frame 12, and this adhesive 13 is a silicone compound having a low outgassing tendency and high heat resistance; in a better mode case, it can maintain its adhesive strength at temperatures 100 - 200 degrees C and it exhibits results of TML being 1.0 % or lower and CVCM being 0.1 % or lower when tested in accordance with ASTM E595-93; thus this pellicle is useful for EUV light exposure lithography.
摘要:
A flame retardant organopolysiloxane composition which exhibits excellent heat resistance, and even when exposed to high temperatures, suffers no foaming within the cured product, meaning no deterioration occurs in the waterproof and moisture-proof properties or the electrical insulation properties. The composition comprises: (A) an organopolysiloxane represented by a general formula (1) :
(wherein R 1 represents a hydrogen atom or a monovalent hydrocarbon group, R 2 represents a monovalent hydrocarbon group, each Z independently represents an oxygen atom or a divalent hydrocarbon group, a represents 0, 1 or 2, and n represents an integer of 10 or greater), (B) boehmite, and (C) an organosilicon compound represented by a general formula (2) :
R 3 b SiX 4-b (2)
(wherein R 3 represents a monovalent hydrocarbon group, X represents a hydrolyzable group, and b represents 0, 1 or 2), or a partial hydrolysis-condensation product thereof, or a combination thereof.
摘要翻译:耐热性优异的阻燃性有机聚硅氧烷组合物即使暴露在高温下也不会在固化物中发泡,因此防水防潮性或电绝缘性不发生变质。 该组合物包含:(A)由通式(1)表示的有机聚硅氧烷:其中R 1表示氢原子或一价烃基,R 2表示一价烃基,各Z独立地表示氧原子或二价 烃基,a表示0,1或2,n表示10以上的整数),(B)勃姆石,(C)由通式(2)表示的有机硅化合物:€ƒ€ƒ€ ƒ€ƒ€ƒ€ƒR 3 b SiX 4-b€ƒ€ƒ€ƒ(2)(其中R 3表示一价烃基,X表示可水解基团,b表示0, 1或2)或其部分水解缩合产物,或其组合。
摘要:
There is provided a pellicle 1 for lithography having a frame 12, a film 11 and an agglutinant layer 13 (an adhesive to bond the pellicle on a photomask), in which the agglutinant layer 13 is doped with a luminescence material so as to facilitate the inspection of the quality of the adhesion between the agglutinant layer 13 and the photomask; preferably the luminescence material is a kind that glows in response to UV irradiation, and a preferable dosage of the luminescence material is no less than 0.01 mass % but less than 1.0 mass %.
摘要:
There is provided a pellicle having a frame, a membrane and an agglutinant layer (adhesive to bond the pellicle on a photo mask) in which the release liner (detachable sheet) laid to the agglutinant layer for protection thereof is controlled to have a surface roughness of 5 - 30 micrometers on the side of the liner which is attached to the agglutinant layer, with a result that the releasability of the liner is improved suitably.
摘要:
A pellicle is proposed in which the agglutinant layer which enable the pellicle to be adhered to a photomask is doped with a mechanoluminescent material so that the uniformness of the thickness of the agglutinant layer can be confirmed, when the pellicle is adhered to the photomask, by observing visually or by CCD camera for any irregularity in the pattern of the light emitted from the agglutinant layer.
摘要:
A pellicle is proposed in which the agglutinant layer which enables the pellicle to adhere to a photomask is doped with a de-foaming agent which depends on a reactive fluorine-modified silicone oil for its anti-foaming performance, and typically such reactive fluorine-modified silicone oil has a vinyl group at both ends of its molecular chain.
摘要:
A pellicle is proposed in which the agglutinant layer which enable the pellicle to be adhered to a photomask is doped with a mechanoluminescent material so that the uniformness of the thickness of the agglutinant layer can be confirmed, when the pellicle is adhered to the photomask, by observing visually or by CCD camera for any irregularity in the pattern of the light emitted from the agglutinant layer.
摘要:
There is provided a pellicle 1 for lithography having a frame 12, a film 11 and an agglutinant layer 13 (an adhesive to bond the pellicle on a photomask), in which the agglutinant layer 13 is doped with a luminescence material so as to facilitate the inspection of the quality of the adhesion between the agglutinant layer 13 and the photomask; preferably the luminescence material is a kind that glows in response to UV irradiation, and a preferable dosage of the luminescence material is no less than 0.01 mass % but less than 1.0 mass %.