METHOD FOR MANUFACTURING ELECTRONIC DEVICE
    5.
    发明公开

    公开(公告)号:EP3657532A1

    公开(公告)日:2020-05-27

    申请号:EP18835150.6

    申请日:2018-07-09

    IPC分类号: H01L21/301 H01L23/00 H05K9/00

    摘要: Provided is a method of producing an electronic device, including a step (A) of preparing a structure (60) which includes an electronic component (10) having a circuit forming surface (10A), and an adhesive laminated film (50) which includes a base material layer (20), an unevenness-absorptive resin layer (30), and an adhesive resin layer (40) in this order and in which the adhesive resin layer (40) is attached to the circuit forming surface (10A) of the electronic component (10) such that the circuit forming surface (10A) is protected; and a step (B) of forming an electromagnetic wave-shielding layer (70) on the electronic component (10) in a state of being attached to the adhesive laminated film (50).

    ADHESIVE LAMINATED FILM AND METHOD FOR PRODUCING ELECTRONIC DEVICE

    公开(公告)号:EP3546540A1

    公开(公告)日:2019-10-02

    申请号:EP17873047.9

    申请日:2017-11-16

    摘要: An adhesive laminate film (50) of the present invention has a heat-resistant resin layer (10), a flexible resin layer (20), and an adhesive resin layer (30) in this order, a peel strength P 0 between the heat-resistant resin layer (10) and the flexible resin layer (20), which is based on JIS Z0237 and measured using a method described below, is equal to or more than 0.01 N/25 mm and equal to or less than 2.0 N/25 mm, and a peel strength P 1 between the heat-resistant resin layer (10) and the flexible resin layer (20) after a thermal treatment of the adhesive laminate film (50) at 160°C for four hours is equal to or more than 0.05 N/25 mm and equal to or less than 1.5 N/25 mm,
    (method for measuring peel strength) the adhesive laminate film (50) is attached to a silicon wafer so that the adhesive resin layer (30) comes into contact with the silicon wafer. Next, the heat-resistant resin layer (10) is peeled off from the flexible resin layer (20) using a tensile tester in a 180-degree direction under conditions of 25°C and a tensile rate of 300 mm/minute, a strength (N/25 mm) at this time is measured twice, and an average value is regarded as the peel strength.

    ELECTRONIC DEVICE PRODUCTION METHOD, ADHESIVE FILM FOR ELECTRONIC DEVICE PRODUCTION, AND ELECTRONIC COMPONENT TESTING DEVICE

    公开(公告)号:EP3533850A1

    公开(公告)日:2019-09-04

    申请号:EP17863464.8

    申请日:2017-10-24

    发明人: HAYASHISHITA Eiji

    摘要: A method for manufacturing electronic apparatus of the present invention includes: a step (A) of preparing a structure (100) provided with an adhesive film (50) and one or two or more electronic components (70) affixed to an adhesive surface of the adhesive film (50); a step (B) of disposing the structure (100) in the electronic component testing apparatus (200) such that the electronic component (70) is positioned over an electronic component installation region (85) of a sample stand (80) of the electronic component testing apparatus (200) with the adhesive film (50) interposed between the electronic component (70) and the electronic component installation region (85), the electronic component testing apparatus (200) being provided with the sample stand (80) including the electronic component installation region (85) and a probe card (90) that is provided at a position facing the sample stand (80) and includes a probe terminal (95); a step (C) of evaluating the properties of the electronic component (70) in a state of being affixed to the adhesive film (50) with the probe terminal (95) being in contact with a terminal (75) of the electronic component (70); and a step (D) of picking up the electronic component (70) from the adhesive film (50) after the step (C). In addition, at least in the step (C), the structure (100) is disposed within a frame (150), an end portion (55) of the adhesive film (50) is fixed to the frame (150), and an upper surface (155) of the frame (150) is disposed below an upper surface (88) of the electronic component installation region (85) of the sample stand (80) in a perpendicular direction X of the sample stand (80).