METHOD FOR PRODUCING LAMINATED ARTICLES, PARTICULARLY FOR PACKAGING PERISHABLE AND/OR CHEMICALLY AGGRESSIVE SUBSTANCES, AND CONTAINERS PRODUCED WITH SAID METHOD
    94.
    发明授权
    METHOD FOR PRODUCING LAMINATED ARTICLES, PARTICULARLY FOR PACKAGING PERISHABLE AND/OR CHEMICALLY AGGRESSIVE SUBSTANCES, AND CONTAINERS PRODUCED WITH SAID METHOD 失效
    用于生产多层的物体,特别是易腐烂和/或化学侵蚀性物质的包装和THEN制成的容器

    公开(公告)号:EP0850135B1

    公开(公告)日:2001-07-25

    申请号:EP96931792.4

    申请日:1996-09-11

    申请人: FEBUS S.r.l.

    IPC分类号: B29C51/14 B32B31/00 B65D65/40

    摘要: A method for producing laminated items, particularly for packaging and storing perishable and/or chemically aggressive substances, includes the following steps: a) preparing a mold that is shaped complementarily to the item to be produced; b) depositing, at least two superimposed layers of thermoplastic materials having chemical and physical characteristics that provide impermeableness to fluids, mechanical strength, resistance to chemicals on different levels, wherein one of the characteristics is predominant with respect to the others in one of the layers; c) welding the superimposed layers, on the surfaces that are mutually in contact, by simultaneous heating and compression; d) rapid cooling of the resulting item. Welding occurs at relatively low temperatures and pressures, so as to avoid substantially altering the chemical and physical properties of the basic materials of the individual layers.

    ANTI-PRICK DISC FOR THE ENCAPSULATION OF SYRINGE NEEDLES
    95.
    发明公开
    ANTI-PRICK DISC FOR THE ENCAPSULATION OF SYRINGE NEEDLES 失效
    窗边,避免在密封的注射器针头刺入

    公开(公告)号:EP1058567A1

    公开(公告)日:2000-12-13

    申请号:EP98943810.6

    申请日:1998-07-31

    IPC分类号: A61M5/32

    CPC分类号: A61M5/3213

    摘要: An anti-prick disc (1) for protecting an operator's hands from being pricked during an encapsulation operation of a needle (4) of a syringe (5) by a capsule (3), including a shield element (2) and a through hole (6) provided in the shield element. The through hole (6) has dimensions such that the capsule (3) may be inserted through the through hole (6) and held by the operator together with the shield element (2) during the encapsulation operation in which the needle (4) is inserted into the capsule (3) thus held while the shield element (2) protects the operator's hands from being pricked by the needle (4).

    A PROCESS FOR ENCAPSULATING VIABLE ANIMAL CELLS
    96.
    发明授权
    A PROCESS FOR ENCAPSULATING VIABLE ANIMAL CELLS 失效
    方法用于封装LIVING动物细胞

    公开(公告)号:EP0907725B1

    公开(公告)日:2000-10-11

    申请号:EP96919810.0

    申请日:1996-05-28

    申请人: Biosil A.G.

    IPC分类号: C12N11/14 C12M3/00

    摘要: A process for encapsulation of viable animal cells suitable for research and industrial applications, such as production of artificial organs, tissue and cell transplantation and production of cell derived substances, includes the steps of: a) providing sterilized supports made of organic and/or inorganic compounds and with suitable geometry to immobilize the desired loads of cells, b) incubating a cell suspension with the supports in order to ensure adhesion to the support surface, c) encapsulating the cells with a permanent layer formed by investing the supports with a reactive gas current composed of a carrier gas saturated by inorganic alkoxides for time intervals variable in function of cell nature and load, support geometry and porosity, d) treating the encapsulated viable cells with steam under mild conditions to perform total hydrolysis of residual alkoxide groups, e) storing the cells encapsulated on the supports by immersion into appropriate culture media. The encapsulation methods enables self-survival of the cells while avoiding antibody and immune-cell invasive action.

    MULTIFUNCTIONAL OPERATING TABLE
    97.
    发明公开
    MULTIFUNCTIONAL OPERATING TABLE 有权
    多功能一体机操作

    公开(公告)号:EP1032350A1

    公开(公告)日:2000-09-06

    申请号:EP98950272.9

    申请日:1998-11-12

    IPC分类号: A61G13/00 A61G13/02

    CPC分类号: A61G13/00 A61G13/02

    摘要: A multifunctional operating table comprises a column (2) with a ground support platform (2'), a plane member (3) apt to support the patient to be operated and means for removable connection between the column (2) and the plane member (3), in which the column defines a symmetrical longitudinal plane (K). The removable connection means is comprised of mechanical coupling means (29, 30, 33, 34), of the kind having corresponding complementarily shaped profiles tapered towards the top, electronic means (37, 38, 39, 40) for transmitting information and electrical means for transmitting power.

    VAGINAL DOUCHING AND/OR ENTEROCLYSM DEVICE
    98.
    发明公开
    VAGINAL DOUCHING AND/OR ENTEROCLYSM DEVICE 失效
    设备进行冲洗阴道和/或肠。

    公开(公告)号:EP1028763A2

    公开(公告)日:2000-08-23

    申请号:EP97948888.9

    申请日:1997-11-05

    IPC分类号: A61M3/02

    CPC分类号: A61M3/0254

    摘要: A vaginal douching and/or enteroclysm device including a grip holder (26a) for being held by a user's hand, a cannula (36) connected to the grip holder (26a), a liquid container (24a) for containing liquids, and an electric pump (10) arranged for delivering fluid from the liquid holder (24a) to the cannula (36). The electric pump (10) is selectively activated by means of a switch (40) carried by the grip holder (26a) and actuatable when engaged by the user's hand. The electric pump (10) may be completely arranged inside the grip holder (26a), which may also contain a rechargeable battery (42) for operating the electric pump (10), and which may further support the liquid container (24a), while a base (44) is provided for removably supporting the grip holder (26a) such that the grip holder (26a) is completely removable from said base (44). Alternatively, the device may include a box (18) for containing the electric pump (10) and for supporting the liquid container (24) and the grip holder (26), and a bendable liquid delivery tube (32) interconnected between the grip holder (26) and the electric pump (10).

    ROTARY DISC FILTRATION APPARATUS
    99.
    发明公开
    ROTARY DISC FILTRATION APPARATUS 有权
    带有旋转垫圈过滤系统

    公开(公告)号:EP1027128A1

    公开(公告)日:2000-08-16

    申请号:EP98947704.7

    申请日:1998-10-15

    申请人: Giordani, Tiziano

    发明人: Giordani, Tiziano

    IPC分类号: B01D33/15 B01D33/80 B01D33/39

    摘要: A rotary disc filtration apparatus, for filtering liquids containing solid particles, comprises a vessel (2) which defines an internal surface (13), at least one inlet opening (23) for the liquid to be filtered and one outlet opening for the filtered liquid, at least one pair of coaxial filter discs (5), substantially plane, axially spaced, rotatably mounted in the vessel, each of the filter discs (5) having a peripheral edge (8) co-operating with a least a part of the internal vessel surface (13) to define together with the latter a filtering chamber (14). Each filter disc (5) is supported peripherally on the internal side of the vessel with no central supporting part. Each filter disc (5) comprises an annular frame (7) on which the filtering surface (10) is fixed in such a way to cover completely and continuously the internal surface of the frame. The apparatus allows the disassembling of each single filtering disc. Moreover it allows the installation of driving means with lower power compared with filtering apparatuses having axial drive.

    METHOD FOR SELECTIVE PLASMA ETCH
    100.
    发明公开
    METHOD FOR SELECTIVE PLASMA ETCH 审中-公开
    方法选择性等离子刻蚀

    公开(公告)号:EP1012877A1

    公开(公告)日:2000-06-28

    申请号:EP98944527.5

    申请日:1998-08-25

    IPC分类号: H01L21/311

    CPC分类号: H01L21/31116

    摘要: Disclosed is a method for improving the selectivity of dielectric layers to photoresist layers and base layers. The method is performed in a plasma processing chamber, and the photoresist layer is coated over the dielectric layer. The method includes introducing an etchant source gas into the plasma processing chamber, which consists essentially of a CxFy gas and an N2 gas. The method further includes striking a plasma in the plasma processing chamber from the etchant source gas. The method additionally includes etching at least a portion of the dielectric layer with the plasma through to a base layer that underlies the dielectric layer. The method is also well suited for anisotropically etching an oxide layer with very high selectivities to Si, Si3N4, TiN, and metal silicides.