摘要:
The invention provides a colored photosensitive composition including: a coloring agent with a content of from 50% by weight to 80% by weight with respect to the total solid content of the composition; an oxime-based initiator with a content of from 5% by weight to 20% by weight with respect to the total solid content of the composition; and a resin containing at least one first structural unit represented by any one of the following formulae (1) to (3) containing an unsaturated double bond, and at least one second structural unit represented by the following formula (4) containing an acid group, wherein a ratio of the first structural unit to the second structural unit is 1.5 or more (molar ratio).
摘要:
The invention relates to a process for enhancing the contrast of colour filters comprising α copper phthalocyanine or ε copper phthalocyanine, wherein a 1,4-diamino-anthraquinone dye or 1,9-annellated derivative thereof, of which the most bathochromic solution absorption peak in the visible spectrum is at from 575 to 615 nm, preferably at from 585 to 605 nm (as compared with around 630 nm for usual 1,4-diamino-anthraquinone dyes or 1,9-annellated derivatives thereof) is used in combination with α copper phthalocyanine or ε copper phthalocyanine. Also claimed are colour filters comprising such 1,4-diamino-anthraquinone dyes or 1,9-annellated derivatives thereof, as well as a novel compound of Formula (II), wherein R16 is halogen, phenyl, benzyl or C1-C8alkyl and R17 is H, R16 is H and R17 is C1-C8alkyl, or R16 and R17 are both H; R18 is H, halogen, C1-C8alkyl or SO2NR13R14; R19, R2O and R21 are each independently from the others halogen or C1-C8alkyl; and R22 is independently from R18 SO2NR13R14, with the proviso that at least one of R18 and R22 is SO2NR13R14, and two radicals of Formula (II) can optionally be linked together via a direct bond or a group -O-, -S-, -NR14-, -CO-, -CO2-, -CONR14- or -CO2- connecting together each a substituent R16, R17, R18, R19, R20, R21 and R11 from both radicals of formula (II).
摘要:
The present invention provides a colored photosensitive resin composition which causes a small change in exposure when a pattern is subjected to projection exposure. Disclosed is a colored photosensitive resin composition comprising a dye, a photo acid generator, a curing agent, an alkali-soluble resin, a solvent, and a compound represented by the formula (1):
in the formula (I), R 1 to R 3 each independently represents a hydrogen atom, a linear alkyl group having 1 to 6 carbon atoms, a branched alkyl group having 3 to 12 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, and a hydrogen atom on the linear alkyl group having 1 to 6 carbon atoms, a hydrogen atom on the branched alkyl group having 3 to 12 carbon atoms, a hydrogen atom on the cycloalkyl group and a hydrogen atom on the aryl group may be substituted with a hydroxyl group, provided that at least one of R 1 to R 3 represents a group other than a hydrogen atom.
摘要:
The invention provides a negative curable composition comprising a colorant, a photopolymerization initiator, a radical polymerizable monomer, a binder, and a monofunctional thiol compound, wherein the content of the radical polymerizable monomer with respect to the total solid content of the composition is from about 10 mass % to about 50 mass %, and the content of the binder with respect to the total solid content of the composition is about 20 mass % or less; a color filter formed by using the composition; and a method of producing the color filter. The negative curable composition has excellent developability at high sensitivity and enables formation of a fine rectangular pattern even in a low-binder content formulation.
摘要:
Provided are a polymerizable group-containing and fluorine-containing adamantane derivative capable of affording a cured product having good heat resistance, good mechanical properties such as surface hardness and a low refractive index, a resin composition containing such a polymerizable group-containing adamantane derivative, and a fluorine-containing adamantane derivative which is useful as a reaction intermediate used for the production of the polymerizable group-containing and fluorine-containing adamantane derivative. Specifically provided are a fluorine-containing adamantane derivative represented by the general formula (I) below, a polymerizable group-containing and fluorine-containing adamantane derivative represented by the general formula (II) below, and a resin composition containing such a polymerizable group-containing and fluorine-containing adamantane derivative. In the formulas, X 1 and X 2 each represent OH or NH 2 , a, b and c each represent an integer of 0 or more and a + b + c ≥ 1, for example a = b = 0 and c = 1, Z 3 represents, for example, -C 2 H 4 -, s and t each represent an integer of 1 to 15, u represents an integer of 0 to 14, s + t + u = 16, for example s = 2, t = 14, u = 0, and X 3 represents, for example, -O-CO-CH=CH 2 .
摘要翻译:提供能够提供具有良好耐热性,良好机械性能如表面硬度和低折射率的固化产物的含可聚合基团的含氟金刚烷衍生物,含有这种含聚合基团的金刚烷衍生物的树脂组合物, 和可用作制备含聚合基团的含氟金刚烷衍生物的反应中间体的含氟金刚烷衍生物。 具体地提供由以下通式(I)表示的含氟金刚烷衍生物,下述通式(II)表示的可聚合基团的含氟金刚烷衍生物和含有这样的可聚合基团的含氟金刚烷衍生物, 含氟和金属金刚烷衍生物。 在该式中,X 1和X 2分别表示OH或NH 2,a,b和c各自表示0以上的整数,a + b + c‰×1,例如a = b = 0,c = 1 Z 3表示例如-C 2 H 4 - ,s和t各自表示1〜15的整数,u表示0〜14的整数,s + t + u = 16,例如s = 2, t = 14,u = 0,X 3表示例如-O-CO-CH = CH 2。
摘要:
The invention relates to a pigment preparation, characterised in that it contains the C.I. Pigment Red 254 with an average particle size of between 20 and 100 nm and at least one pigment dispersant of formula (II) or (III). In said formulae, A represents a bivalent group -O-, -NR3-, -NR16-SO3- G+, B represents a bivalent group -NR16- SO3- G+ and Q2 represents an organic pigment group, selected from the group containing C.I. Pigment Red 264 and C.I. Pigment Violet 19.
摘要:
The present invention discloses a method of producing a pattern-formed structure, comprising the processes of: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof can be modified by the action of photocatalyst; preparing a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing photocatalyst; arranging the substrate for a pattern-formed structure and the photocatalyst-containing-layer side substrate such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a clearance of no larger than 200 µm therebetween; and irradiating energy to the characteristic-modifiable layer from a predetermined direction, and modifying characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer. According to this method, a highly precise pattern can be formed without necessity to carry out any post-treatment after exposure. Further, there is no concern that the pattern-formed structure itself deteriorates because the produced pattern-formed structure is free of the photocatalyst.