VORRICHTUNG UND VERFAHREN ZUM TROCKNEN VON BEHANDLUNGSGUT
    112.
    发明公开
    VORRICHTUNG UND VERFAHREN ZUM TROCKNEN VON BEHANDLUNGSGUT 审中-公开
    FOR干燥设备以及处理方法

    公开(公告)号:EP1678450A2

    公开(公告)日:2006-07-12

    申请号:EP04790305.9

    申请日:2004-10-12

    IPC分类号: F26B1/00

    摘要: The invention relates to a device and to a corresponding method which is used to dry a treated product (1). Said device comprises transport means (3) which are used to transport the treated product (1) along a conveyor belt. Gas outlet devices (4, 5) which are disposed in an opposite manner are arranged above and below the conveyor belt. A gaseous drying medium is guided by blowing means to the gas outlets in a separate manner via supply pipes (8, 9). Pressure allocated to a respective gas outlet device (4, 5) is detected and a gas flow associated with the gas outlet device (4, 5) is controlled by control means according to said pressure.

    DÜSENANORDNUNG
    115.
    发明公开

    公开(公告)号:EP1565268A1

    公开(公告)日:2005-08-24

    申请号:EP03785685.3

    申请日:2003-11-28

    IPC分类号: B05B1/20

    摘要: Disclosed is a nozzle arrangement which can be used especially as a gushing nozzle in electroplating plants through which circuit boards penetrate in a horizontal direction. Said nozzle arrangement comprises an elongate housing (2) that is provided with at least one port for supplying a liquid used for treating a workpiece, e.g. a circuit board, and preferably several slit-shaped liquid discharge ports (8) for dispensing the treatment liquid. A liquid duct (5) is embodied inside the housing (2) in order to supply treatment liquid from the liquid supply port to the liquid discharge ports (8). In order to obtain a flow rate of the treatment liquid, which is as constant as possible at the liquid discharge ports (8), (a) the cross section of the passage of the liquid duct (5) for the treatment liquid decreases steadily from the liquid supply port in the longitudinal direction of the housing, and/or (b) an accumulation space is provided upstream of where the liquid leaves the liquid discharge ports (8).

    METHOD FOR ELECTROLESS NICKEL PLATING
    117.
    发明授权
    METHOD FOR ELECTROLESS NICKEL PLATING 有权
    方法的化学镀镍

    公开(公告)号:EP1343921B1

    公开(公告)日:2005-03-16

    申请号:EP01992803.5

    申请日:2001-10-04

    摘要: A method for electroless metal plating of substrates, more specifically with electrically non-conductive surfaces, by which the substrates may be reliably metal plated at low cost under manufacturing conditions as well and by means of which it is possible to selectively coat the substrates to be treated only, and not the surfaces of the racks. The method involves the following steps: a. pickling the surfaces with a solution containing chromate ions; b. activating the pickled surfaces with a silver colloid containing stannous ions; c. treating the activated surfaces with an accelerating solution in order to remove tin compounds from the surfaces; and d. depositing, by means of an electroless nickel plating bath, a layer that substantially consists of nickel to the surfaces treated with the accelerating solution, the electroless nickel plating bath containing at least one reducing agent selected from the group comprising borane compounds.

    METHOD AND DEVICE FOR TREATING FLAT AND FLEXIBLE WORK PIECES
    118.
    发明公开
    METHOD AND DEVICE FOR TREATING FLAT AND FLEXIBLE WORK PIECES 审中-公开
    方法和设备用于平板治疗和灵活的工件

    公开(公告)号:EP1510111A1

    公开(公告)日:2005-03-02

    申请号:EP03730130.6

    申请日:2003-05-27

    IPC分类号: H05K3/00 C25D17/06

    CPC分类号: C25D17/06 H05K3/0085

    摘要: The device in accordance with the invention and the method serve to treat flat and flexible work pieces (1) with a fluid, preferably in electroplating plants and etching facilities. The device and the method permit to place foil-type work pieces (1) in particular in such a manner into the fluid, a wet-chemical or electrochemical processing fluid for example, that the work pieces (1) will not deform or hit the side walls of a processing tank (3) or other built-in components. For this purpose, the processing tank (3) is assigned a protective carrier (5) into which the work pieces (1) are lowered, said carrier (5) being in a largely empty condition. For treatment, the protective carrier (5) is for example lowered into a tank (3) which is filled with processing fluid, said processing fluid flowing into the protective carrier (5). Means are provided on the protective carrier (5) by means of which the processing fluid is allowed to controlledly flow into the protective carrier (5).

    CATHODE FOR ELECTROCHEMICAL REGENERATION OF PERMANGANATE ETCHING SOLUTIONS
    120.
    发明授权
    CATHODE FOR ELECTROCHEMICAL REGENERATION OF PERMANGANATE ETCHING SOLUTIONS 有权
    阴极电化学再生的高锰酸盐蚀刻溶液

    公开(公告)号:EP1287182B1

    公开(公告)日:2004-11-17

    申请号:EP01945134.3

    申请日:2001-05-15

    IPC分类号: C25B1/28 C25F7/02 C25B11/04

    摘要: In order to regenerate permanganate solutions being utilized for the etching and roughening of plastics surfaces electrolytic methods are known. Though relatively small quantities of by-products are produced with these methods as compared to chemical regeneration methods, large quantites of manganese dioxide are produced when printed circuit boards are treated. In order to avoid formation of manganese dioxide during the regeneration method a novel cathode (2) has been found which is provided with a porous, electrically nonconducting layer (7) on the cathode body (3). The layer (7) preferably consists of a plastics material being resistant to acid and/or alkali.