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1.发明公开
公开(公告)号：EP4028582A1
公开(公告)日：2022-07-20
申请号：EP20767849.1
申请日：2020-09-11
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公开(公告)号：EP1565268B1
公开(公告)日：2006-05-17
申请号：EP03785685.3
申请日：2003-11-28
发明人： KOPP, Lorenz , KUNZE, Henry , WIENER, Ferdinand
IPC分类号： B05B1/20
CPC分类号： H01L21/67051 , B05B1/205 , B08B3/02 , H05K3/0085 , H05K2203/0746 , H05K2203/1509
摘要： Disclosed is a nozzle arrangement which can be used especially as a gushing nozzle in electroplating plants through which circuit boards penetrate in a horizontal direction. Said nozzle arrangement comprises an elongate housing (2) that is provided with at least one port for supplying a liquid used for treating a workpiece, e.g. a circuit board, and preferably several slit-shaped liquid discharge ports (8) for dispensing the treatment liquid. A liquid duct (5) is embodied inside the housing (2) in order to supply treatment liquid from the liquid supply port to the liquid discharge ports (8). In order to obtain a flow rate of the treatment liquid, which is as constant as possible at the liquid discharge ports (8), (a) the cross section of the passage of the liquid duct (5) for the treatment liquid decreases steadily from the liquid supply port in the longitudinal direction of the housing, and/or (b) an accumulation space is provided upstream of where the liquid leaves the liquid discharge ports (8).
摘要翻译： 本发明公开了一种喷嘴装置，该装置尤其可以用作在电路板沿水平方向穿过的电镀设备中的喷涌喷嘴。 所述喷嘴装置包括细长壳体（2），该细长壳体设置有至少一个用于供应用于处理工件的液体的端口，例如， 电路板，并且优选地具有用于分配处理液的多个狭缝形液体排出口（8）。 液体导管（5）构造在壳体（2）内，以便将处理液从液体供应口供应到液体排出口（8）。 为了获得在液体排出口（8）处尽可能恒定的处理液的流量，（a）用于处理液的液体管道（5）的通道的横截面从 在壳体的纵向方向上的液体供给口和/或（b）储存空间设置在液体离开液体排出口（8）的位置的上游。
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公开(公告)号：EP2422591B1
公开(公告)日：2018-05-30
申请号：EP10715712.5
申请日：2010-04-22
发明人： KUNZE, Henry , THOMAS, Christian
CPC分类号： H05K3/0085 , C23C14/568 , C23C16/4401 , C23C16/4412 , C23C16/54 , C25D17/06 , H01L21/67017 , H05K1/0393 , H05K3/068 , H05K3/243 , H05K13/0061 , H05K2203/0165 , H05K2203/0271 , H05K2203/1509 , H05K2203/1545
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4.发明公开APPARATUS AND METHOD FOR THE ELECTROLYTIC TREATMENT OF A PLATE-SHAPED PRODUCT 有权DEVICE AND METHOD FOR电解处理板形洁具
公开(公告)号：EP2176450A1
公开(公告)日：2010-04-21
申请号：EP08759143.4
申请日：2008-06-03
CPC分类号： C25D5/08 , C25D5/04 , C25D17/001 , C25D21/10 , H05K3/241 , H05K2203/0746 , H05K2203/1509
摘要： An apparatus for the electrolytic treatment of the product L using a treatment agent is used to make the treatment of a plate-shaped product more uniform. This apparatus includes: devices for retaining 40, 42 the product L in the apparatus, one or a plurality of flow devices 10, which each include at least one nozzle 15 and are disposed situated opposite the product L, one or a plurality of counter electrodes 30, which are inert relative to the treatment agent and are disposed parallel to at least one treatment surface, means for generating a relative movement 44 between the product L, on the one side, and the flow devices 10 and/or the counter electrodes 30, on the other side, in at least one direction parallel to a treatment surface. The product L can be immersed into the treatment agent during the treatment.
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5.发明公开VERTICAL SYSTEM FOR THE PLATING TREATMENT OF A WORK PIECE AND METHOD FOR CONVEYING THE WORK PIECE 有权垂直系统用于工件用来承载工件电镀处理和方法
公开(公告)号：EP2162569A2
公开(公告)日：2010-03-17
申请号：EP08759145.9
申请日：2008-06-03
发明人： SCHNEIDER, Reinhard , KUNZE, Henry , WIENER, Ferdinand , HAUF, Uwe , SCHELLER, Britta , KLINGL, Heinz
摘要： Vertical system for the plating treatment of a work piece, the system comprising at least two treatment modules, wherein retaining devices for the work pieces are provided in the treatment modules, and at least one transport device including at least one gripping device, which retains the work piece and has a respective fastening device, and each fastening device comprises first and second clamping devices, each associated with one side of the work piece, wherein both the first and second clamping devices are displaceable for gripping and releasing the work pieces, wherein the gripping device comprises at least two fastening devices that are spaced apart from one another, each of the first and second clamping devices are moveable torsion bars as a result of which the work piece is tensioned between the fastening devices during clamping parallel to its first side.
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6.发明授权VERFAHREN, BEHANDLUNGSSTATION UND ANLAGE ZUM BEHANDELN VON FLÄCHIGEM BEHANDLUNGSGUT 有权过程中，处理站AND SYSTEM FOR片材的治疗要治疗
公开(公告)号：EP2430889B1
公开(公告)日：2014-04-30
申请号：EP10721984.2
申请日：2010-05-12
发明人： KUNZE, Henry
CPC分类号： H05K3/0085 , B05C3/09 , B05C11/06 , C25D7/0621 , C25D7/0642 , C25D17/00 , C25D21/10 , H05K2203/0143 , H05K2203/0746 , H05K2203/1509 , H05K2203/1572
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7.发明公开VERFAHREN, HALTEMITTEL, VORRICHTUNG UND SYSTEM ZUM TRANSPORTIEREN EINES FLÄCHIGEN BEHANDLUNGSGUTES UND BE- ODER ENTLADEEINRICHTUNG 有权方法，保持装置，装置和系统用于运送待遇平平优良，做工或卸载
公开(公告)号：EP2422591A1
公开(公告)日：2012-02-29
申请号：EP10715712.5
申请日：2010-04-22
发明人： KUNZE, Henry , THOMAS, Christian
CPC分类号： H05K3/0085 , C23C14/568 , C23C16/4401 , C23C16/4412 , C23C16/54 , C25D17/06 , H01L21/67017 , H05K1/0393 , H05K3/068 , H05K3/243 , H05K13/0061 , H05K2203/0165 , H05K2203/0271 , H05K2203/1509 , H05K2203/1545
摘要： In order to transport a flat material feedstock (21) in a system for the chemical and/or electro-chemical treatment of the material feedstock (21), in which the material feedstock (21) is transported in a transport plane in a transport direction (5), retaining means (22, 25) are attached to the material feedstock (21). The retaining means (22, 25) hold the material feedstock (21) at at least two points of an edge region of the material feedstock (21), said edge region being oriented in the transport direction (5) during the transport of the material feedstock (21). The retaining means (22, 25) are detachably coupled to a transport apparatus (41), which moves the retaining means (22, 25) in the transport direction in order to transport the material feedstock (21). At least during one transportation stage of the material feedstock (21), a force (6, 7) having a force component is applied to an area of the material feedstock (21), for example to the longitudinal edge region, said force component being located in the transport plane and extending transversely to the transport direction (5).
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8.发明授权TREATMENT UNIT FOR THE WET-CHEMICAL OR ELECTROLYTIC TREATMENT OF FLAT WORKPIECES 有权治疗方法湿化学或电解处理扁平工件的
公开(公告)号：EP1694886B1
公开(公告)日：2007-09-26
申请号：EP04801219.9
申请日：2004-12-07
发明人： HAUF, Uwe , KUNZE, Henry , WIENER, Ferdinand
IPC分类号： C25D7/06
CPC分类号： H05K3/0085 , C23C18/1619 , C23C18/163 , C25D7/0614 , C25D17/001 , C25D17/28 , H05K2203/0746 , H05K2203/1509 , H05K2203/1572 , Y10S414/135 , Y10S414/141
摘要： The present invention relates to treatment units for the wet-chemical or electrolytic treatment of flat workpieces 1, such as metal foils, printed circuit foils or printed circuit boards, in which the workpieces are transported on a conveying path by means of conveying members 6. The treatment unit comprises carrier elements with recesses , said carrier elements being oriented to be parallel to the conveying path, and at least one module system for carrying the conveying members that consist of insertion elements 14, 26, preferably arranged in pairs, the at least one module system being configured such that it registers with and is preferably slidable into the recesses of the carrier elements. The treatment unit is preferably utilized in horizontal conveyorized lines.
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公开(公告)号：EP1565268A1
公开(公告)日：2005-08-24
申请号：EP03785685.3
申请日：2003-11-28
发明人： KOPP, Lorenz , KUNZE, Henry , WIENER, Ferdinand
IPC分类号： B05B1/20
CPC分类号： H01L21/67051 , B05B1/205 , B08B3/02 , H05K3/0085 , H05K2203/0746 , H05K2203/1509
摘要： Disclosed is a nozzle arrangement which can be used especially as a gushing nozzle in electroplating plants through which circuit boards penetrate in a horizontal direction. Said nozzle arrangement comprises an elongate housing (2) that is provided with at least one port for supplying a liquid used for treating a workpiece, e.g. a circuit board, and preferably several slit-shaped liquid discharge ports (8) for dispensing the treatment liquid. A liquid duct (5) is embodied inside the housing (2) in order to supply treatment liquid from the liquid supply port to the liquid discharge ports (8). In order to obtain a flow rate of the treatment liquid, which is as constant as possible at the liquid discharge ports (8), (a) the cross section of the passage of the liquid duct (5) for the treatment liquid decreases steadily from the liquid supply port in the longitudinal direction of the housing, and/or (b) an accumulation space is provided upstream of where the liquid leaves the liquid discharge ports (8).
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10.发明授权VERFAHREN UND ANLAGE ZUM BEHANDELN VON FLÄCHIGEM BEHANDLUNGSGUT UND VORRICHTUNG ZUM ENTFERNEN ODER ABHALTEN VON BEHANDLUNGSFLÜSSIGKEIT 有权用于治疗平面的方法和系统处理以及用于去除或防止处理液DEVICE
公开(公告)号：EP2430890B1
公开(公告)日：2014-12-10
申请号：EP10721985.9
申请日：2010-05-12
发明人： KUNZE, Henry , WIENER, Ferdinand
CPC分类号： H05K3/0085 , B05C3/09 , B05C11/06 , C25D7/0621 , C25D7/0642 , C25D17/00 , C25D21/10 , H05K2203/0143 , H05K2203/0746 , H05K2203/1509 , H05K2203/1572
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