公开(公告)号：EP3043207A1

公开(公告)日：2016-07-13

申请号：EP15197003.5

申请日：2015-11-30

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Toru, Shirasaki

IPC分类号： G03F7/20 ,  G03F1/62 ,  G03F1/64 ,  G03F1/66 ,  H01L21/673

CPC分类号： G03F1/62 ,  G03F1/66 ,  G03F7/70916 ,  G03F7/70983 ,  H01L21/67359 ,  H01L21/67366

摘要： There is provided a pellicle container for storing a pellicle (2) used in lithography, having a tray and a cover between which the pellicle is stored, and the tray has a pellicle mount section (6) on which the pellicle is used to be mounted, but the tray of this container further has a plane plate (7), preferably a quartz plane plate, having a flatness of 10 micrometers or smaller provided on top of the pellicle mount so as to stabilize the flatness of the pellicle, especially its agglutinant layer (4).

公开(公告)号：EP3037879A1

公开(公告)日：2016-06-29

申请号：EP15003172.2

申请日：2015-11-05

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Horikoshi, Jun ,  Yanase, Yu

IPC分类号： G03F1/64

CPC分类号： G03F1/64 ,  C09K11/7734 ,  G01N21/70

摘要： A pellicle is proposed in which the agglutinant layer which enable the pellicle to be adhered to a photomask is doped with a mechanoluminescent material so that the uniformness of the thickness of the agglutinant layer can be confirmed, when the pellicle is adhered to the photomask, by observing visually or by CCD camera for any irregularity in the pattern of the light emitted from the agglutinant layer.

公开(公告)号：EP2927745A2

公开(公告)日：2015-10-07

申请号：EP15157728.5

申请日：2015-03-05

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Horikoshi, Jun

IPC分类号： G03F1/00 ,  G03F1/64 ,  G03F1/62

摘要： There is provided a pellicle 1 for lithography having a frame 12, a film 11 and an agglutinant layer 13 (an adhesive to bond the pellicle on a photomask), in which the agglutinant layer 13 is doped with a luminescence material so as to facilitate the inspection of the quality of the adhesion between the agglutinant layer 13 and the photomask; preferably the luminescence material is a kind that glows in response to UV irradiation, and a preferable dosage of the luminescence material is no less than 0.01 mass % but less than 1.0 mass %.

摘要翻译： 提供了一种用于光刻的防护薄膜1，其具有框架12，膜11和凝集层13（粘合剂以将防护薄膜组合在光掩模上），其中凝集层13掺杂有发光材料，以便于 检查凝集层13和光掩模之间的粘附质量; 优选地，发光材料是响应于紫外线照射而发光的那种，并且发光材料的优选剂量不小于0.01质量％但小于1.0质量％。

公开(公告)号：EP2034360B1

公开(公告)日：2015-08-12

申请号：EP08163381.0

申请日：2008-09-01

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Shirasaki, Toru, Shin-Etsu Chemical co., Ltd.

IPC分类号： G03F1/64

CPC分类号： G03F1/64 ,  Y10T428/13

公开(公告)号：EP2333607A3

公开(公告)日：2014-03-19

申请号：EP10014421.1

申请日：2010-11-09

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Shirasaki, Toru ,  Fukuda, Kenichi

IPC分类号： G03F1/00 ,  G03F1/64 ,  G03F1/62

CPC分类号： G03F1/64 ,  G03F1/62

摘要： A pellicle (10) for lithography includes a pellicle frame (3), a pellicle membrane (1) adhered onto the upper end surface of the pellicle frame (3) and an agglutinant layer (4) formed on the lower surface of the pellicle frame (3) and the agglutinant layer (4) is formed by hardening a curable composition containing a straight chain perfluoro compound having a perfluoro structure in a main chain.
The thus constituted pellicle (10) generates only a small amount of a decomposition gas even when it is used for a long time, thereby preventing solid-like foreign materials from separating out on a pattern region of a photomask (5) and can suppress degradation of the agglutinant agent contained in an agglutinant layer (4) to be used for fixing a photomask (5) to the pellicle frame (3). Further, this pellicle (10) can be easily peeled off from a photomask (5) and replaced with a new one.

公开(公告)号：EP2267529B1

公开(公告)日：2013-07-24

申请号：EP10167329.1

申请日：2010-06-25

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Sekihara, Kazutoshi

IPC分类号： G03F1/64

CPC分类号： G03F1/64

公开(公告)号：EP2211231A3

公开(公告)日：2012-07-18

申请号：EP10151303.4

申请日：2010-01-21

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Nagata, Yoshihiko

IPC分类号： G03F1/64

CPC分类号： G03F1/64

摘要： There is provided a pellicle for photolithography having a plurality of air vents formed in a pellicle frame for photolithography and having the air vents covered with a dustproof filter in which the air vents in the frame are counterbored and a counterbored wall surface of the air vents is tapered.

公开(公告)号：EP0782719A4

公开(公告)日：1998-01-07

申请号：EP95935047

申请日：1995-09-22

申请人： MICRO LITHOGRAPHY INC

发明人： WANG CHING-BORE

IPC分类号： G03F1/64 ,  G03F7/20 ,  H01L21/027 ,  G03B27/62 ,  A47G1/12

CPC分类号： G03F1/64 ,  G03F7/70866

摘要： A protective mask (10) is provided for use with a pellicle (8) which is mounted to a photomask (30) during photolithography, with a light source being directed toward the photomask (30). The pellicle (8) includes a pellicle membrane (12) mounted to a pellicle frame (16) by a first adhesive layer (18) and with the pellicle frame (16) being mounted to the photomask (30) by a second adhesive layer (19). The protective mask (10) is fabricated of an opaque material and is positioned between the light source and the two adhesive layers (18, 19) to shield them from the light source so that the adhesive layers (18, 19) are not degraded by the light source.

公开(公告)号：EP0778804A4

公开(公告)日：1998-01-07

申请号：EP95933195

申请日：1995-09-22

申请人： MICRO LITHOGRAPHY INC

发明人： WANG CHING-BORE ,  YEN YSUNG-TSAI

IPC分类号： C08F4/00 ,  C08J5/12 ,  C09J4/02 ,  C09J181/00 ,  G03F1/64 ,  B60J1/00

CPC分类号： C08J5/124 ,  C08J2327/12 ,  G03F1/64

摘要： A 100 %-solids adhesive emulsion for use in mounting an optical pellicle (110) to its frame (116) includes a first component with a resin that is curable according to a free radical curing mechanism, a second component including a fluorocarbon compound, a surfactant, and an initiator. The components are emulsifiable into an adhesive emulsion that includes an effective amount of initiator, between about 0.1 % and 5 % by volume surfactant, between about 2 % and 40 % of the second component, and the remainder being the first component. The first component may include a mercapto-ester polymeric resin and an acrylate monomeric resin. The second component may include a fluorocarbon compound containing an acrylate functional group, such as the fluorinated acrylate monomers pentadecafluorooctylacrylate and octafluoropentylacrylate. Also described is a method for adhering an optical pellicle membrane (110) to a pellicle frame (116) with plural upper planar surfaces.

公开(公告)号：EP4296778A2

公开(公告)日：2023-12-27

申请号：EP23206063.2

申请日：2015-11-16

申请人： ASML Netherlands B.V.

发明人： AZEREDO LIMA, Jorge, Manuel ,  BOGAART, Erik, Willem ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  BRULS, Richard, Joseph ,  DEKKERS, Jeroen ,  JANSEN, Maarten ,  JANSSEN, Paul ,  KAMALI, Mohammad, Reza ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LIPSON, Matthew ,  LOOPSTRA, Erik, Roelof ,  LYONS, Joseph, Harry ,  ROUX, Stephen ,  VAN DEN BOSCH, Gerrit ,  VAN DEN HEIJKANT, Sander ,  VAN DER GRAAF, Sandra ,  VAN DER MEULEN, Frits ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC分类号： G03F1/64

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.