PROCESS FOR PRODUCING LAMINATE COMPRISING AL-BASED GROUP III NITRIDE SINGLE CRYSTAL LAYER, LAMINATE PRODUCED BY THE PROCESS, PROCESS FOR PRODUCING AL-BASED GROUP III NITRIDE SINGLE CRYSTAL SUBSTRATE USING THE LAMINATE, AND ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE
    13.
    发明公开
    PROCESS FOR PRODUCING LAMINATE COMPRISING AL-BASED GROUP III NITRIDE SINGLE CRYSTAL LAYER, LAMINATE PRODUCED BY THE PROCESS, PROCESS FOR PRODUCING AL-BASED GROUP III NITRIDE SINGLE CRYSTAL SUBSTRATE USING THE LAMINATE, AND ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE 审中-公开
    用于生产层压板的单晶从A到AL-BASED III族氮化物,直所制造的层压板,用于生产从A到AL-BASED III族氮化物的单晶衬底USING和层压ALUMINIUMNITRIDEINKRISTALLSUBSTRAT

    公开(公告)号:EP2243866A1

    公开(公告)日:2010-10-27

    申请号:EP08870572.8

    申请日:2008-12-16

    IPC分类号: C30B29/38 C30B25/18

    摘要: The present invention is a method for producing a laminated body, comprising the steps of: (1) preparing a base substrate having a surface formed of a single crystal which is different from the material constituting the Al-based group-III nitride single crystal layer to be formed; (2) forming an Al-based group-III nitride single crystal layer having a thickness of 10 nm to 1.5 µm on the single crystal surface of the prepared base substrate; (3) forming on the Al-based group-III nitride single crystal layer a non-single crystal layer being 100 times or more thicker than the Al-based group-III nitride single crystal layer without breaking the previously-obtained Al-based group-III nitride single crystal layer; and (4) removing the base substrate. The method provides a substrate which can be suitably used as a base substrate for producing an Al-based group-III nitride single crystal self-supporting substrate, of which surface is formed of a single crystal of an Al-based group-III nitride, and which is free from cracking and warpage.

    摘要翻译: 本发明是生产的层叠体,其包括以下步骤的方法:(1)制备具有形成在单晶的表面上的基底基板的所有这是从构成Al系III族氮化物单晶层的材料不同 要形成; (2),其具有的厚度为所制备的基底基板的单晶表面上10纳米至1.5微米的Al系III族氮化物单晶层的形成; (3)在形成Al系III族氮化物单晶层上形成非单晶层是不破坏先前获得的Al系基团比的Al系III族氮化物单晶层的100倍或更厚 -III族氮化物单晶层; 和(4)除去所述基底基板。 该方法提供了可以适合用作基底基板在Al系III族氮化物单晶自支撑衬底的制造中,该表面形成的Al系III族氮化物的单晶构成的基底, 而所有这一切是从开裂和翘曲免费。